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Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography

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1.An Automated Method for Overlay Sample Plan Optimization Based on Spatial Variation Modeling

机译：基于空间变化建模的覆盖样本规划优化自动化方法
- 作者：Xuemei Chen;Moshe E Preil;Mathilde Le Goff-Dussable;Mireille Maenhoudt
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- overlay metrology;
- lithography process control;
- sampling;
- spatial variation;
- generalized nested ANOVA;
2.From compliance to control: off-roadmap metrology for low-k1 lithography

机译：从遵守控制：低K1光刻的路线图计量
- 作者：Christopher P. Ausschnitt
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- metrology;
- lithography;
- process control;
- critical dimension;
- dose;
- focus;
- overlay;
3.Chemical Mechanical Planarization Process Induced Within Lot Overlay Variation in 0.20um DRAM: Solution and Simulation Model

机译：化学机械平面化过程在0.20um DRAM中批量覆盖范围内诱导：解决方案和仿真模型
- 作者：C. P. Alex Chen;Brian Huang;Wilson Lee;W. J. Chung;T. K. Hou
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- chemical mechanical planarization;
- overlay;
4.Prevention of Optics and Resist Contamination in 300mm Lithography -- Improvements in Chemical Air Filtration

机译：300mm光刻中的光学和抗蚀剂污染 - 化学空气过滤的改善
- 作者：D. A. Kinkead;A. Grayfer;O. Kishkovich
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
5.SEM Sentinel - SEM Performance Measurement System

机译：SEM Sentinel - SEM性能测量系统
- 作者：B. N. Damazo;A. E. Vladar;A. V. Ling;M. A. Donmez;M. T. Postek;E. C. Jayewardene
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- SEM;
- performance;
- monitoring;
- automatic;
- computer control;
6.CD SEM Carryover Effect Investigation

机译：CD SEM核对效果调查
- 作者：Anna Chernakova;Alan Fan
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- CS SEM;
- precision;
- carryover;
- photoresist;
- damage;
7.Redefining Critical in Critical Dimension Metrology

机译：在关键维度计量中重新定义至关重要
- 作者：Farid Askary;Neal T. Sullivan
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- CD metrology;
- accuracy;
- calibration;
- linewidth standards;
- process control;
8.Electromagnetic Scatterometry Applied to In Situ Metrology

机译：电磁散射测定法应用于原位计量
- 作者：Michael Yeung;Eytan Barouch
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scatterometry;
- single integral equation;
9.Inspectability Study of Advanced Photomaska With OPC Structures

机译：高级PhotomaskA与OPC结构的检查性研究
- 作者：Michael Cross;Kaustuve Bhattacharyya
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- inspection;
- OPC;
- assist;
- serif;
- defect;
10.Impact of Optimized Illumination Upon Simple Lambda Based Design Rules for Low K1 Lithography

机译：优化照明对低k1光刻简单Lambda设计规则的影响
- 作者：Sergei Postnikov;Kevin Lucas;Karl Wimmer
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- bitcell patterning;
- low K1 lithography;
- off-axis illumination;
11.High precision metrology by means of a novel stereo imaging technique based on Atomic Force Microscopy

机译：基于原子力显微镜的新型立体化成像技术，高精度计量
- 作者：Bernardo D. Aumond;Kamal Youcef-Toumi
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- metrology;
- profilometer;
- atomic force microscope;
- deconvolution;
- stereo imaging;
12.Three Dimensional Simulations of SEM Imaging and Charging

机译：SEM成像和充电的三维模拟
- 作者：Luca Grella;Gian Lorusso;Tim Niemi;TC Chuang;David L. Adler
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
13.Implementation of Spectroscopic Critical Dimension (SCD~(TM)) for Gate CD Control and Stepper Characterization

机译：用于门CD控制和步进临界尺寸的光谱临界尺寸（SCD〜（TM））
- 作者：John Allgair;Dave Benoit;Mark Drew;Rob Hershey;Lloyd C. Litt;Pedro Herrera;Umar Whitney;Marco Guevremont;Ady Levy;Suresh Lakkapragada
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- spectroscopic CD;
- optical microscopy;
- process control;
- focus;
- exposure;
14.SPM Characterization of Anomalies in Phase Shift Mask and Their Effect on Wafer Features

机译：相移掩模中异常的SPM表征及其对晶片特征的影响
- 作者：S. Muckenhirn;A. Meyyappan;K. Walch;Mark Maslow;Geert Vandenberghe;Johannes Van Wingerden
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scanning probe microscope (SPM);
- phase shift mask (PSM);
- profile;
- metrology;
15.Wafer Edge Dies Yield Improvements

机译：晶圆边缘成果提高
- 作者：Gan Kia Huat Philip;Tan Yew Kong;Sun Gin Ping
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- critical dimension;
- profile;
- exposure/focus;
- leveling;
- wafer edge exposure and topography;
16.Measurement precision of optical scatterometry

机译：光学散射测量精度
- 作者：Petre C. Logofatu;John R. McNeil
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scatterometry;
- ellipsometry;
- error analysis;
- spectroscopy;
- sensitivity;
- measurement precision;
17.CD Monitoring of Critical Photo Layers in 6 Inch GaAs IC Process

机译：6英寸GaAs IC过程中临界照片层的CD监测
- 作者：Ying Liu;Iain Black;Kezhou Xie
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- IC gallium-arsenide process;
- metrology;
- sidewall profile;
- CD monitoring;
- gauge repeatability and reproducibility;
18.Gauge Control for sub 170 nm DRAM Product Features

机译：用于SUB 170 NM DRAM产品功能的规格控制
- 作者：Neal Lafferty;Christopher Gould;Mike Littau;Christopher J. Raymond
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
19.Interferometric Testing of Photomask Substrate Flatness

机译：光掩模衬底平整度的干涉式测试
- 作者：Chris J. Evans;Robert E. Parks;Lian-Zhen. Shao;Tony Schmitz;Angela Davies
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- photomasks;
- interferometry;
- flatness;
- Ritchey-Common test;
20.Monte Carlo model of charging in resists in e-beam lithography

机译：电子束光刻中抗蚀剂充电蒙特卡罗模型
- 作者：Yeong-Uk Ko;David C. Joy
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- beam deflection;
- charging;
- electron beam lithography;
- mask pattern;
- insulator;
21.Advanced statistical process control: Controlling sub-0.18μm Lithography and other processes

机译：高级统计过程控制：控制Sub-0.18μm光刻和其他过程
- 作者：Amit Zeidler;Klaas Jelle Veenstra;Terrence E. Zavecz
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- APC;
- advanced process control;
- PPC;
- predictive process control;
- process control;
- feed forward;
- lithography;
- overlay;
- CD;
- critical dimensions;
22.Method for prevention of unopened contact-hole in dual damascene process

机译：防止双镶嵌过程中未开封接触孔的方法
- 作者：Gyu-Ho Lyu;Chan-Ho Kim;Suk-Joo Lee;Hee-Hong Yang;Dae-Yup Lee;Ji-Young Yoo;Jeong-Woo Lee;Yoo-Hyon Kim;Jeong-Lim Nam;Woo-Sung Han
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- trench first dual damascene;
- resolution limit;
- resist absorption;
- trench side wall effect;
- reflected light;
- DOF;
- CD variation;
23.Technology in the Internet Era

机译：互联网时代的技术
- 作者：Dennis D. Buss
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- Internet;
- IC;
- DSP;
- analog;
- scaling;
- system-on-a-Chip;
24.CD Measurement of Re-entry (overhang) Obtained by Liftoff Techniques in 6 Inch GaAs IC Process

机译：通过6英寸GaAs IC工艺中的升降技术获得的重新进入（悬垂）测量
- 作者：Ying Liu;Iain Black
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- IC gallium-arsenide process;
- metrology;
- liftoff process;
- CD monitoring;
- gauge repeatability and reproducibility;
25.Wafer induced Reading Error in Metal Sputtering Process

机译：晶圆诱导金属溅射过程中的读取误差
- 作者：Dae-Joung Kim;Seok-Hwan Oh;Gi-Sung Yeo;Yong-Guk Bae;Jae-Hwan Kim;Young-Hee Kim
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
26.Optimisation of dielectric anti-reflective coatings on a transparent substrate in sub-half-micron CMOS technology

机译：亚半微米CMOS技术透明基板上的介电抗反射涂层优化
- 作者：G. Arthur;B. Martin;C. Wallace
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
27.Metrology and Analysis of Two Dimensional SEM Patterns

机译：二维SEM模式的计量与分析
- 作者：Chris A. Mack;Sven Jug;Rob Jones;Prasad Apte;Sandy Williams;Mike Pochkowski
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- SEM image analysis;
- critical shape difference;
- corner rounding;
- ProDATA;
- SIAM;
28.Advances in Process Overlay

机译：过程覆盖的进步
- 作者：Paul C. Hinnen;Henry J. L. Megens;Maurits van der Schaar;Richard J. F. van Haren;Evert C. Mos;Sanjay Lalbahadoersing;Frank Bornebroek;David Laidler
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- overlay;
- alignment systems;
- CMP;
- aluminum sputtering;
- copper dual-damascene;
- spin coating;
- STI;
- 300-mm;
29.Scatterometry for shallow trench isolation (STI) process metrology

机译：浅沟槽隔离（STI）过程计量散射测定法
- 作者：Christopher J. Raymond;Mike Littau;Rick Markle;Matthew Purdy
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scatterometry;
- optical;
- metrology;
- diffract;
- CD;
- shallow;
- trench;
- STI;
30.Secondary Electron Image Profiles Using Bias Voltage Technique In Deep Contact Hole

机译：使用深触点孔中的偏置电压技术进行二次电子图像曲线
- 作者：Yeong-Uk Ko;David C. Joy;Neal Sullivan;Martin E. Mastovich
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- deep contract hole;
- secondary electron;
- charging;
- bias voltage technique;
31.A Comprehensive Analysis of Statistical and Model-Based Overlay Lot Disposition Methods

机译：基于统计和模型的覆盖批次配置方法的综合分析
- 作者：David Crow;Ken Flugaur;Joseph C. Pellegrini;Etienne Joubert
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- overlay;
- registration;
- steppers;
- scanners;
- metrology;
- yield;
32.W-CMP Alignment using ASML's ATHENA System on an I-line Stepper

机译：W-CMP在I-Line步进上使用ASML的Athena系统对齐
- 作者：K. John Prasad;D. Arunagiri Rajan;Tan Yew Kong;Gin Ping Sun;Stephen Morgan;Merritt Phillips;Bruce Ng
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- W-CMP alignment;
- ATHENA;
33.Reference Material 8091: New Scanning Electron Microscope Sharpness Standard

机译：参考材料8091：新扫描电子显微镜清晰度标准
- 作者：Andras E. Vladar;Michael T. Postek;Nien-Fan Zhang;Robert D. Larrabee;Samuel N. Jones;Russell E. Hajadj
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scanning electron microscope;
- CD;
- SEM;
- performance;
- measurement;
- CD-SEM;
- metrology;
- standard;
- reference material;
34.Edge Determination for Polycrystalline Silicon Lines on Gate Oxide

机译：栅极氧化物上多晶硅线的边缘测定
- 作者：J. S. Villarrubia;A. E. Vladar;J. R. Lowney;M. T. Postek
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
35.Asymmetric line profile measurement using angular scatterometry

机译：使用角散射测量法测量不对称线轮廓测量
- 作者：Christopher J. Raymond;Mike Littau;Todd Pitts;Peter Nagy
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scatterometry;
- optical;
- metrology;
- diffract;
- CD;
- asymmetry;
- asymmetric;
- profile;
- sidewall;
36.Monitoring Printing Fidelity with Image Correlation Measurements on the CDSEM

机译：在CDSEM上监控使用图像相关测量的印刷保真度
- 作者：Chas Archie;Eric Solecky;Tim Hayes;Bill Banke
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- CD metrology;
- CD-SEM;
- image correlation;
- pattern fidelity monitoring;
37.The control of resist flow process for sub-0.15 μm small contact hole by latent image

机译：通过潜像控制抗抗蚀剂流程的抗蚀剂流程
- 作者：Byung-Kap Kim;Suk-Joo Lee;Dae-Yeop Lee;Jeong-Woo Lee;Jeong-Lim Nam
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
38.Evaluation Of Overlay Measurement Target Designs for Cu Dual Damascene Process

机译：Cu双镶嵌过程覆盖测量目标设计的评价
- 作者：Moitreyee Mukherjee-Roy;Rakesh Kumar;G. S. Samudra
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- alignment;
- overlay;
- target;
- misregistration;
- low K dielectric;
- damascene;
39.An Evaluation of the Dual Exposure Technique

机译：对双曝光技术的评价
- 作者：Harry Sewell;Victor Bunze;Nick Deluca;Diane McCafferty
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- exposure;
- phase-shift mask;
- K-factor;
- double exposure;
- dual exposure;
- simultaneous exposure;
40.Impact of attenuated PSM repair for 130nm poly gate lithography process

机译：减振PSM修复对130nm多栅极光刻工艺的影响
- 作者：Xuelong Shi;Stephen Hsu;Robert Socha;Fung Chen;Andy Cheng;Clyde Su;Jackie Cheng;Andy Chen;Henry Lin;David Wang;Dick Chen;Arthur Lin;Will Conley;Dan Metzger;Sunil Desai;Philip H. Imamura;Micheal Sherrill
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- focused ion beam;
- defect;
- repair;
41.Innovative Techniques for Automatic Multi-CD-SEM Image Quality Monitoring, and Matching

机译：自动多CD-SEM图像质量监测的创新技术和匹配
- 作者：Haiqing Zhou;Chih-Yu Wang;Joe J. Pratt
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
42.Initial results with a point projection microscope

机译：具有点投影显微镜的初始结果
- 作者：Bernhard Frost;David Joy
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- in-line holography;
- off-axis holography;
- point reflection microscope;
- nanotip field emitter;
43.DualBeam metrology: A new technique for optimizing 0.13 μm photo processes

机译：双排计量：一种优化0.13μm照片进程的新技术
- 作者：Steven Berger;Denis Desloge;Robert Virgalla;Todd Davis;Ted Paxton;David Witko
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- CD measurement;
- DualBeam;
- litho cell optimization;
- resist sidewall;
- process latitude;
44.Swing curve phase and amplitude effects in optical lithography

机译：光光刻中的摆动曲线相和幅度效应
- 作者：Brian Martin;Tom Tighe;Graham Arthur
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
45.Comparison of Edge Detection Methods using a Prototype Overlay Calibration Artifact

机译：边缘检测方法的比较使用原型叠加校准伪影
- 作者：R. M. Silver;J. Jun;E. Kornegay;R. Morton
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
46.Application of Critical Shape Analyses to Two Dimensional Patterns

机译：临界形状分析对二维模式的应用
- 作者：Mike Pochkowski;Chris A. Mack;Bryan S. Kasprowicz
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- SEM image analysis;
- critical shape;
- critical shape difference;
- proDATA;
- SIAM;
47.High-Accuracy EUV Metrology of PTB Using Synchrotron Radiation

机译：使用Synchrotron辐射的PTB高精度EUV计量
- 作者：F. Scholze;B. Beckhoff;G. Brandt;R. Fliegauf;A. Gottwald;R. Klein;B. Meyer;U. Schwarz;R. Thornagel;J. Tummler;K. Vogel;J. Weser;G. Ulm
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- reflectometry;
- detector calibration;
- metrology;
- irradiation testing;
48.Enhancing the rules for optical proximity correction to improve process latitude

机译：增强光学邻近校正的规则，以改善过程纬度
- 作者：Brian Martin;Graham Arthur
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
49.Post-development Defect Evaluation

机译：开发后缺陷评估
- 作者：Osamu Miyahara;Yukio Kiba;Yuko Ono
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- defect;
- satellite;
- CA resist;
- AFM;
- AES;
50.Light diffraction based overlay measurement

机译：基于光衍射的覆盖测量
- 作者：J. Bischoff;R. Brunner;J. Bauer;U. Haak
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- overlay measurement;
- stepper qualification;
- diffraction;
- diffraction grating;
51.Silicon single atom steps as AFM height standards

机译：硅单个原子作为AFM高度标准
- 作者：Ronald Dixson;Ndubuisi G. Orji;Joseph Fu;Vincent Tsai;Ellen D. Williams;Raghu Kacker;Theodore Vorburger;Hal Edwards;Debra Cook;Paul West;Ralph Nyffenegger
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- AFM;
- metrology;
- step height;
- atomic steps;
52.Measurement of Sidewall, Line and Line-edge Roughness with Scanning Probe Microscopy

机译：扫描探针显微镜测量侧壁，线路和线边缘粗糙度
- 作者：K. Walch;A. Meyyappan;S. Muckenhirn;J. Margail
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
53.Scanning Probe Position Encoder (SPPE)-a new approach for a high precision and high sped position measurement system

机译：扫描探头位置编码器（速度） - 高精度和高速位置测量系统的新方法
- 作者：Tetsuo Ohara
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scanning probe microscopy;
- position encoder;
- nanotechnology;
- overlay metrology;
- position measurement;
54.Lithography Process Optimization for 1300nm Poly Gate Mask And The Impact of Mask Error Factor

机译：1300nm多栅极掩模的光刻工艺优化及掩模误差因子的影响
- 作者：Stephen Hsu;Xuelong Shi;Robert J. Socha;J. Fung Chen;Jason Yee;Mohan Ananth;Sunil Desai;Philip H. Imamura;Micheal Sherrill;Y. C. Tseng;H. A. Chang;J. F. Kao;Alex Tseng;W. J. Liu;Anseime Chen;Arthur Lin;Jan Pieter Kujten;Eric Jacobs;Arjan Verhappen
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- SB OPC;
- model OPC;
- MEEF;
- overlapped process windows;
- attenuated PSM;
- ArF;
- KrF;
55.193 nm Photo-Resist Shrinkage after Electron Beam Exposure

机译：电子束曝光后193 nm光致抗蚀剂
- 作者：Bo Su;Guy Eytan;Andrew Romano
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
56.Electric force microscopy with a single carbon nanotube tip

机译：具有单个碳纳米管尖的电力显微镜
- 作者：J. A. Dagata;F. S. S. Chien;S. Gwo;K. Morimoto;T. Inoue;J. Itoh;H. Yokoyama
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scanned probe microscopy;
- lithography;
- electric force microscopy;
- carbon nanotube;
- silicon-on-insulator;
57.Haidinger interferometer for silicon wafer TTV measurement

机译：用于硅晶片TTV测量的Haidinginger干涉仪
- 作者：Robert E. Parks;Lianzhen Shao;Angela Davies;Christopher J. Evans
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- interferometry;
- haidinger interferometer;
- phase shifting interferometry;
- TTV;
- silicon wafer measurement;
58.Experimental Determination of the Impact of Polysilicon LER on sub-100 nm Transistor Performance

机译：多晶硅LER对亚100nm晶体管性能影响的实验确定
- 作者：Kyle Patterson;John L. Sturtevant;John Alvis;Nancy Benavides;Dough Bonser;Nigel Cave;Carla Nelson-Thomas;Bill Taylor;Karen Turnquest
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
59.Determination of Best Focus and Exposure Dose using CD-SEM Side-wall Imaging

机译：使用CD-SEM侧壁成像测定最佳焦点和曝光剂量
- 作者：Thomas Marschner;Guy Eytan;Ophir Dror
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- CD-Metrology;
- CD-SEM;
- focus-exposure matrix;
- side-wall profiles;
60.Three Dimensional Top Down Metrology: A Viable Alternative to AFM or Cross Sections?

机译：三维顶部下降计量：AFM或横截面的可行替代品？
- 作者：Eric Solecky;Chas Archie;Tim Hayes;Bill Banke;Roger Cornell
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- critical dimension (CD);
- scanning electron microscopy (SEM);
- atomic force microscopy (AFM);
- sidewall angle;
61.Automated search method for AFM and profilers

机译：AFM和分析器的自动搜索方法
- 作者：Michael Ray;Yves C. Martin
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- AFM;
- profilometer;
- search;
- image analysis;
- match;
- throughput;
- automation;
- recipe creation;
- cost of ownership;
62.Investigation of Full-Field CD Control of Sub-100 nm Gate Features by Phase-shift 248-nm Lithography

机译：通过相移248-nm光刻调查亚100nm栅极特征的全场CD控制
- 作者：M. Fritze;B. Tyrrell;D. Astolfi;P. Davis;B. Wheeler;R. Mallen;J. Jarmolowicz;S. Cann;D. Chan;P. Rhyins;M. Mastovich;N. Sullivan;R. Brandom;C. Carney;J. Ferri;B. A. Blachowicz
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- optical lithography;
- phase-shift mask;
- CD control;
63.Practical Monitor and Control of SEM Astigmatism in Manufacturing

机译：制造业中SEM Atrigmatism的实际监测与控制
- 作者：Sandy Dupuis;Tim Hayes;Chas Archie;Eric Solecky
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- CD metrology;
- CD-SEM;
- electron beam stigmation;
- SPC;
64.Impact and Characterization of Mask Repair on Wafer CD Uniformity

机译：薄饼CD均匀性面膜修复的影响与特征
- 作者：H. M. Chang;W. B. Shieh;Johnson Liu;Brian Chu;L. H. Tu;James Cheng;David Wang;Jackie Cheng;Stephen Hentschel;Vincent Hsu
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
65.Bulge testing of single and dual layer thin films

机译：单层薄膜的凸起测试
- 作者：Dryver R. Huston;Wolfgang Sauter;Patricia S. Bunt;Brian Esser
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- bulge tester;
- thin film;
- dual layer;
- automated;
66.Electrical Linewidth Measurement for Next Generation Lithography

机译：下一代光刻电气线路测量
- 作者：Jongwook Kye;Harry Levinson
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- electrical linewidth measurement;
- electrical CD measurement;
- ELM;
- ECD;
67.Application of SMIF Isolation to Lithography Processes for Contamination Control

机译：SMIF分离在污染控制光刻工艺中的应用
- 作者：Sheng-Bai Zhu
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- pattern defect;
- process instability;
- contamination control;
- SMIF isolation;
68.The problem with submicrometer linewidth standards, and a proposed solution

机译：潜艇线宽标准的问题和提出的解决方案
- 作者：James Potzick
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- linewidth;
- metrology;
- imaging;
- error;
- measurement uncertainty;
- traceability;
- tolerance;
- standards;
69.Sampling strategy and model to measure and compensate the overlay errors

机译：采样策略和模型测量和补偿覆盖错误
- 作者：Chen-Fu Chien;Kuo-Hao Chang;Chih-Ping Chen
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- overlay;
- stepper;
- yield improvement;
- decision analysis;
- semiconductor manufacturing;
70.Improving the Measurement Algorithm for Alignment

机译：改进对齐测量算法
- 作者：Shinichi Nakajima;Yuho Kanaya;Akira Takahashi;Koji Yoshida;Hideo Mizutani
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- measurement algorithm;
- wavelet transform;
- filter bank;
- interpolation;
- symmetry;
- alignment;
- stepper;
71.Characterization of Optical Proximity Correction Features

机译：光学邻近校正特征的表征
- 作者：John Allgair;Michelle Ivy;Kevin Lucas;John Sturtevant;Richard Elliott;Chris A. Mack;Craig MacNaughton;John Miller;Mike Pochkowski;Moshe Preil;John Robinson;Frank Santos
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- SEM image analysis;
- CD SEM;
- OPC;
- image analysis;
- lithography;
- CSD;
72.Using Pattern Quality Confirmation to control a metal-level DUV process with a top-down CD-SEM

机译：使用图案质量确认控制金属级DUV进程，顶层CD-SEM
- 作者：Chien-Sung Liang;Haiqing Zhou;Mark Boehm;Ricky Jackson;Chih-Yu Wang;Mike Slessor
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- lithography process control;
- critical dimension;
- CD-SEM;
- Pattern Qualification Confirmation (pQC);
73.Active Monitoring and Control of Electron Beam Induced Contamination

机译：电子束诱导污染的主动监测与控制
- 作者：Andras E. Vladar;Michel T. Postek;Ronald Vane
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scanning electron microscope;
- CD;
- SEM;
- contamination;
- measurement;
- CD-SEM;
- lithography;
- metrology;
- accuracy;
- linewidth;
74.Microeconomics of 300mm process module control

机译：300mm工艺模块控制的微观经济学
- 作者：Kevin M. Monahan;Arun Chatterjee;Georges Falessi;Ady Levy;Meryl Stoller
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
75.193nm Metrology: facing severe e-beam/resist interaction phenomena

机译：193NM Metrology：面临严重的电子束/抗蚀性相互作用现象
- 作者：Mauro Vasconi;Maddalena Bollin;Gina Cotti;Laurent Pain;Vincent Tirard
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- 193nm;
- SEM;
- resist;
- CD variation;
- CD process integration;
76.High-speed Mapping of Inter-transistor Overlay Variations Using Active Electrical Metrology

机译：使用主动电气计量晶体管间覆盖变化的高速映射
- 作者：X. Ouyang;C. N. Berglund;R. F. W. Pease
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- lithography;
- overlay;
- metrology;
- inter-transistor;
- short-range;
- spatial variations;
- active electrical metrology;
- spatial frequency;
77.Foot (bottom corner) measurement of a structure with SPM

机译：脚（底角）测量与SPM的结构
- 作者：A. Meyyappan;M Klos;S. Muckenhirn
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scanning probe microscope (SPM);
- foot;
- probe;
- surface roughness;
78.Optimization of Segmented Alignment Marks for Advanced Semiconductor Fabrication Processes

机译：用于高级半导体制造过程的分段对准标记的优化
- 作者：Qiang Wu;Z. George Lu;Gary Williams;Franz Zach;Bernhard Liegl
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
79.Lens Heating Induced Focus Drift of i-line Step Scan: Correction and Control in a Manufacturing Environment

机译：镜头加热诱导I-Line步骤和扫描的焦点漂移：制造环境中的校正和控制
- 作者：Grace H. Ho;Anthony T. Cheng;Chung-J. Chen;Chin-K. Fang;Meng-C. Li;I-Chung Chang;Po-T. Chu;YC Chu;Kuei-Y. Shu;Chin-Y. Huang;Hsiao-L. Yeh;HC Shiao;HK Lan
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- lens heating;
- i-line Step amp;
- Scan;
- focus drift;
80.Scanner and stepper intrafield distortion characterization-A Comparison and correlation of current techniques

机译：扫描仪和步进Intrafield失真表征 - 当前技术的比较和相关性
- 作者：Brian Martinick;Bill Roberts
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
81.Wafer Scale Error induced by Bottom Anti-Reflective Coating

机译：底部抗反射涂层诱导的晶片刻度误差
- 作者：Dong-Seok Kim;Jong Ho Jeong;Byung Ho Nam;Young Ju Hwang;Young Jin Song
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- wafer-induced-shift;
- WIS;
- bottom anti-reflective coating;
- BARC;
- misalignment;
- wafer scale error;
- overlay;
82.Process Development and Impurities Analysis for the Bottom Antireflective Coating Material

机译：底部抗反射涂料的过程开发和杂质分析
- 作者：Fu-Hsiang Ko;Hsuen-Li Chen;Tiao-Yuan Huang;Hsu-Chun Cheng;Chu-Jung Ko;Tieh-Chi Chu
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- antireflective coating;
- surface reflection;
- BARC material analysis;
- one-step microwave digestion;
83.Improvement In E2 Nozzle Performance - No Imprint Less Contamination

机译：E2喷嘴性能的改进 - 没有印记和污染少
- 作者：Ang Kian Siong;Low Shu Jin;Lim Aik Chin;Lim Chee Keong;Loh Liah Kee;Tan Yew Kong;Xu Xiang Yang
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- E2 nozzle;
- developer;
- contamination;
84.Extended ATHENA~(TM) alignment performance and application for the 100 nm technology node

机译：扩展雅典娜〜（TM）对齐性能和100nm技术节点的应用
- 作者：Ramon Navarro;Stefan Keij;Arie den Boef;Sicco Schets;Frank van Bilsen;Geert Simons;Ron Schuurhuis;Jaap Burghoorn
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- overlay;
- alignment systems;
- wafer alignment strategies;
- RF phase modulation;
- Cu-damascene;
- W-CMP;
- STI;
85.Electrical Characterization of an Ion Beam Mixed Metal/Polymer System

机译：离子束混合金属/聚合物体系的电学表征
- 作者：Runhui Huang;Ryan E. Giedd
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- ion implantation;
- metal;
- polymer;
- interface;
- electrical resistance;
- coulomb gap;
- variable range hopping;
86.Feature-shape and Line-edge Roughness Measurement of Deep sub-micron Lithographic Structures using Small-angle Neutron Scattering

机译：使用小角中子散射的深层微米光刻结构的特征形状和线边粗糙度测量
- 作者：Eric K. Lin;Wen-li Wu;Qinghuang Lin;Marie Angelopoulos
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
87.Scatterometry: a metrology for subwavelength surface-relief gratings

机译：散射测定法：亚波长表面浮雕光栅的计量
- 作者：Petre C. Logofatu;John R. McNeil
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scatterometry;
- phase modulation;
- sensitivity;
88.Evaluation of overlay performance by using air shower at the prealignment

机译：使用预取的空气淋浴评估覆盖性能
- 作者：Amit Ghosh;Tan Yew Kong;Arunagiri Rajan;Sun Gin Ping
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- overlay;
- air-shower;
- X/Y 3sigma;
89.Open-Contact-Failure Detection of via Holes by using Voltage Contrast

机译：使用电压对比度通过孔的开放式触点检测
- 作者：Hidetoshi Nishiyama;Mari Nozoe;Koji Aramaki;Osamu Watanabe;Yoshihiro Ikeda
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- scanning electron microscope;
- wafer inspection;
- open contact;
- contact resistance;
- resistance;
- voltage contrast;
- simulation;
- electron beam;
90.Mechanism of deep UV photo resist tail on inorganic anti-reflective layer film

机译：深紫色光电尾部在无机抗反射层膜上的机制
- 作者：Seung-Jae Lee;Soo Geun Lee;Min Kim;Sun-Hoo Park;Jeong-Lim Nam;Sang-In Lee
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- inorganic ARL(Anti reflective layer);
- DUV PR footing;
- O2;
- NH3;
- N2O plasma treatment;
91.Atomic Force Metrology and 3D Modeling of Micro-Trenching In Etched Photomask Features

机译：蚀刻光掩模特征中微沟的原子力计量和3D模型
- 作者：Bradley Todd;Kirk Miller;V. Pistor
- 会议名称：《Society of Photo-Optical Instrumentation Engineers Conference on Metrology, Inspection, and Process Control for Microlithography》 | 2001年
- phase shift mask;
- PSM;
- defect repair;
- simulation;
- etch;
- AFM;