Improvement In E2 Nozzle Performance - No Imprint Less Contamination

摘要

This paper demonstrates the use of lifted E2 nozzle with modified developer recipe in TEL MARK 8 track to reduce killer defects such as E2 nozzle imprints and contamination such as resist residues and developer strain. This concept has helped to improve machine uptime due to less occurrence of E2 nozzle related defects shutdown.