摘要:
在考虑折射率色散效应基础上,以加权平均反射率作为评价函数,通过智能优化算法对空间硅太阳电池减反射膜进行优化设计,得到了最佳的膜厚参数,并与不考虑色散下设计的减反射膜进行了比较.对MgF2/TiO2,SiO2/TiO2双层减反射膜,与不考虑色散情形相比,考虑色散下优化后的最小加权平均反射率分别减小了36.6%和37.6%;对具有厚度为15 nm的SiO2钝化层的硅太阳电池的MgF2/TiO2,SiO2/TiO2减反射膜重新优化设计,与不考虑色散情形相比,考虑色散下优化后的最小加权平均反射率分别减小了43.9%和33.7%;对具有不同厚度钝化层的空间硅太阳电池,在考虑色散下进行了减反射膜的优化设计.结果发现,随着钝化层厚度的增加,所得减反射膜的最小加权平均反射率也随之增大,减反射效果越来越弱.最后,在考虑与未考虑色散情形下,将钝化层膜厚也作为反演参量后重新设计.结果表明:在色散情形下所设计的减反射膜更佳,对于MgF2/TiO2/SiO2(钝化层)膜系,最佳膜厚参量为 d1(MgF2)=97.6 nm,d2(TiO2)=40.2 nm,d3(SiO2)=4.9 nm;对于SiO2/TiO2/SiO2(钝化层),最佳膜厚参量为d1(SiO2)=85.1 nm,d2(TiO2)=43.4 nm,d3(SiO2)=1.8 nm.%Based on the refractive index dispersion effect,the weighted average reflectivity was used as evaluation function,and the best film thickness parameters of the anti-reflection coatings for the space silicon solar cell was obtained by the intelligent optimization algorithm.The optimization results were compared with that of the anti-reflection coatings designed without considering the dispersion.It displayed that after optimizing,the minimal weighted average reflectivity of the MgF2/TiO2and SiO2/TiO2anti-reflection coatings were reduced by 36.6%and 37.6%under considering the dispersion effect than that without considering dispersion effect.And then the MgF2/TiO2and SiO2/TiO2anti-reflection coatings were deposited on the silicon solar cells with a thickness of 15 nm SiO2passivation layer and optimized again.Comparing without considering dispersion effect,the minimal weighted average reflectivity in the case of dispersion was reduced by 43.9%and 33.7%for the MgF2/TiO2and SiO2/TiO2 coatings with passivation layer,respectively.The optimal design of the anti-reflection coatings were carried out for the space silicon solar cells with different thickness passivation layer.It was found that the minimum weighted average reflectivity of the anti-reflection coatings increased with the increase of the thickness of the passivation layer,meaning that the anti-reflection effect got weaker and weaker.Finally,the anti-reflection coatings were redesigned when the thickness of the passivation layer was also considered as an inversion parameter considering the refractive-index dispersion effect or not.The results show that the anti-reflection film is more optimization by considering the dispersion.For the MgF2/TiO2/SiO2(passivation layer)film system,the optimal film thickness parameters are d1(MgF2)=97.6 nm,d2(TiO2)=40.2 nm,d3(SiO2)=4.9 nm.For the SiO2/TiO2/SiO2(passivation layer)film system,the optimal film thickness parameters are d1(SiO2)=85.1 nm,d2(TiO2)=43.4 nm,d3(SiO2)=1.8 nm.