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Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1

召开年：2006
召开地：San Jose,CA(US)
出版时间：-

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1.Koehler Illumination Analysis for High-resolution Optical Metrology using 193 nm Light

机译：使用193 nm光的高分辨率光学计量的Koehler照明分析
- 作者：Yeung-Joon Sohn;Richard M. Silver
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- kohler illumination;
- koehler factor;
- 193 nm;
- high-resolution optical metrology;
- linewidth profile;
2.Magnification calibration standard for sub - l00nm metrology

机译：低于100nm计量的放大率校准标准。
- 作者：Sachin Deo;David Joy
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- critical dimension (CD);
- metrology;
- line edge roughness (LER);
- pitch;
- scanning electron microscope (SEM);
- accuracy;
- precision;
- traceability;
- Hydrogen Silsesquioxane (HSQ);
3.Resolution Enhancement Technique using Oxidation Process with Nitride Hardmask Process

机译：使用氮化物硬掩模工艺的氧化工艺提高分辨率
- 作者：Eunsoo Jeong;Jeahee Kim;Keeho Kim;Daeyoung Kim;Hyunju Lim
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- RET;
- resolution;
- enhancement;
- oxide mask;
4.Ellipsometric studies of the absorption of liquid by photo resist

机译：光刻胶吸收液体的椭偏研究
- 作者：Hee Jeong;Jaisun Kyung;Songyi Park;Kiyong Lee;Hyungjoo Lee;Hyuknyeong Cheon;Ilsin An;Sook Lee
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- ellipsometry;
- immersion lithography;
- imaging ellipsometry;
5.Effect and procedures of Post Exposure Bake temperature optimization on the CD uniformity in a mass production environment

机译：量产环境中曝光后烘烤温度优化对CD均匀度的影响和程序
- 作者：Kirsten Ruck;Heiko Weichert;Steffen Homig;Frank Finger;Goran Fleischer;Dave Hetzer
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- CD optimizer;
- CD uniformity;
- integrated metrology;
- post exposure bake process;
6.Scatterometry characterization of polysilicon gate profiles in a 90 nm logic process

机译：90 nm逻辑工艺中多晶硅栅极轮廓的散射法表征
- 作者：E.B. Maiken
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- scatterometry;
- OCD;
- sensitivity;
- electrical-test;
- ellipsometry;
- SEM;
7.Phame~TM: a novel phase metrology tool of Carl Zeiss for in-die phase measurements under scanner relevant optical settings

机译：Phame〜TM：Carl Zeiss的新型相位计量工具，用于在扫描仪相关的光学设置下进行模内相位测量
- 作者：Sascha Perlitz;Ute Buttgereit;Thomas Scheruebl
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- phame;
- phase;
- phase metrology;
- scanner phase;
- polarization;
- off axis illumination;
- mask;
- mask inspection;
8.Enhanced Hole Shape of Flash Devices in ArF Lithography by Eliptical Mask Bias Technique

机译：椭圆掩模偏置技术增强了ArF光刻中Flash器件的孔形
- 作者：Young-Doo Jeon;Sungho Jun;Jae-Hyun Kang;Sang-Uk Lee;Jeahee Kim;Keeho Kim
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- contact hole;
- oval hole shape;
- rule based optical proximity correction (OPC);
9.3D anisotropic semiconductor grooves measurement simulations (scatterometry) using FDTD Methods

机译：使用FDTD方法的3D各向异性半导体凹槽测量模拟（散射测量）
- 作者：Hirokimi Shirasaki
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- scatterometry;
- anisotropy;
- semiconductor;
- silicon;
- trench measurements;
- FDTD method;
10.OCD metrology by floating n/k

机译：通过浮动n / k进行OCD计量
- 作者：Shinn-Sheng Yu;Jacky Huang;Chih-Ming Ke;Tsai-Sheng Gau;Burn J. Lin;Anthony Yen;Lawrence Lane;Vi Vuong;Yan Chen
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
11.High-Resolution In-Die Metrology Using Beam Profile Reflectometry and Ellipsometry

机译：使用光束轮廓反射仪和椭偏仪的高分辨率模内计量
- 作者：Chungsam Jun;Jangik Park;Jon Opsal;Heath Pois;In-Kyo Kim;Jung-Wook Kim;Lena Nicolaides
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- CD metrology;
- scatterometry;
- beam profile reflectometry;
- spectroscopic ellipsometry;
- neural networks;
12.The study to enhance the mask global CD uniformity by removing local CD variation

机译：通过消除局部CD变化来增强面罩全局CD均匀性的研究
- 作者：Yongkyoo Choi;Munsik Kim;Oscar Han
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- CD;
- global CD uniformity;
- local CD variation;
- polynomial fitting;
- approximation;
13.Achievement of sub nanometer reproducibility in line scale measurements with the Nanometer Comparator

机译：使用纳米比较器在线规模测量中实现亚纳米重现性
- 作者：Rainer Koening;Jens Fluegge;Harald Bosse;Physikalisch-Technische Bundesanstalt (PTB)
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- registration;
- optical microscopy;
- line scale interferometer;
- vacuum interferometry;
14.Optimization of Lithography Process to Improve Image Deformation of Contact Hole Sub - 90 nm Technology Node

机译：优化平版印刷工艺以改善90nm以下接触孔的图像变形。
- 作者：Sungho Jun;Juhyun Kim;Eunsoo Jeong;Youngje Yun;Jeahee Kim;Keeho Kim
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- contact hole;
- contact edge roughness (CER);
- arf lithography;
15.The Novel Advanced Process Control to Eliminate AlCu-PVD Induced Overlay Shift

机译：消除AlCu-PVD引起的叠加偏移的新型先进过程控制
- 作者：CH Huang;CC Yang;Elvis Yang;TH Yang;KC Chen;Joseph Ku;CY Lu
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- WIS;
- AlCu;
- PVD;
- Advanced Process Control (APC);
- overlay mark;
16.Influence of wafer warpage on photoresist film thickness and extinction coefficient measurements

机译：晶圆翘曲对光致抗蚀剂膜厚度和消光系数测量的影响
- 作者：Xiaodong Wu;Arthur Tay
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- lithography;
- wafer warpage;
- photoresist processing;
17.Non-Contacting Electrostatic Voltmeter for Wafer Potential Monitoring

机译：非接触式静电电压表，用于晶圆电位监测
- 作者：Maciej A. Noras;William A. Maryniak
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- electrostatic voltmeter;
- charge measurement;
18.Enabling Gate Etch Process Development Using Scatterometry

机译：使用散射测量法进行门刻蚀工艺开发
- 作者：Jophy Koshy;Matthew Sendelbach;Pedro Herrera
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- scatterometry;
- cross-section;
- XSEM;
- etch development;
- total measurement uncertainty;
- TMU;
- TMU analysis;
- correlation;
- gate etch;
19.Purge Micro-Environment with Ionized Air to Reduce Chances of ESD Damages to Wafers

机译：用电离空气吹扫微环境，以减少ESD损坏晶圆的可能性
- 作者：Huaping Wang;Yingkai Liu;Mike Cisewski
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- ESD;
- FOUP;
- purge;
- ionizer;
- nitrogen;
- wafer;
- charge;
20.Image quality improvement in inspection systems using double integrator illumination

机译：使用双积分照明提高检查系统的图像质量
- 作者：Akira Takada;Hitoshi Suzuki;Toru Tojo;Masato Shibuya
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- mask;
- defect;
- inspection;
- defect detection sensitivity;
- illumination optics;
- integrator;
- mask image;
21.Implementation Strategies and Return on Investment for Integrated CD Control

机译：集成CD控制的实施策略和投资回报
- 作者：Lawrence Lane;Bob Monteverde
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
22.New Inline AFM Metrology Tool Suited for LSI Manufacturing at the 45-nm Node and Beyond

机译：适用于45纳米节点及以后的LSI制造的新型在线AFM计量工具
- 作者：Manabu Edamura;Yuichi Kunitomo;Takafumi Morimoto;Satoshi Sekino;Toru Kurenuma;Yukio Kembo;Masahiro Watanabe;Shuichi Baba;Kishio Hidaka
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- AFM;
- SPM;
- inline metrology;
- etching;
- CMP;
- lithography;
- roughness;
- carbon nanotube;
- high aspect ratio;
- microlens;
23.Optical characterization of microstructures of high aspect ratio

机译：高纵横比的微结构的光学表征
- 作者：T. Tamulevicius;S. Tamulevicius;M. Andrulevicius;G. Janusas;V. Ostasevicius;A. Palevicius
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- diffraction gratings;
- relative diffraction efficiency;
- micro-fluidic device;
24.Novel method of under-etch defect detection for contact layers based on Si substrate using optic wafer inspection tools

机译：基于硅基板的硅晶片检测工具，用于接触层的欠蚀刻缺陷检测的新方法
- 作者：Byoung-Ho Lee;Jin-Seo Choi;Soo-Bok Chin;Do-Hyun Cho;Chang-Lyong Song
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- under-etch defect;
- optic wafer inspection;
- e-beam wafer inspection;
25.The Optimization of Photoresist Profile for sub-90nm Technology

机译：90nm以下技术的光刻胶轮廓优化
- 作者：Haengleem Jeon;Cheonman Shim;Jiho Hong;Jaewon Han;Keeho Kim
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- lithography;
- arf photoresist;
- soft bake;
- post exposure bake;
- PR profile;
26.Contamination Removal from Collector Optics and Masks: An Essential Step for Next Generation Lithography

机译：去除集光镜和口罩的污染物：下一代光刻的必要步骤
- 作者：H. Shin;S. N. Srivastava;D. N. Ruzic
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
27.Charging measurement using SEM embedded energy filter

机译：使用SEM嵌入式能量滤波器进行充电测量
- 作者：F. Levitov;A. Karabekov;G. Eytan
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- wafer charging;
- local charging;
- energy filter;
- CD measurement;
28.Accurate and Reliable Optical CD of MuGFET down to l0nm

机译：精确可靠的MuGFET光学CD，低至10nm
- 作者：P. Leray;G. F. Lorusso;S. Cheng;N. Collaert;M. Jurczak;S. Shirke
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- scatterometry;
- ellipsometer;
- metrology;
- MugGFET;
- CDSEM;
29.Advanced Defect Definition Methods using Design Data

机译：使用设计数据的高级缺陷定义方法
- 作者：Kyuhong Lim;Dilip Patel;Kyoungmo Yang;Shunsuke Koshihara;Lorena Page;Andy Self;Maurilio Martinez
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- CD-SEM;
- design data;
- two dimensional defect definition;
- designgauge;
- EPE measurement;
- design-based metrology;
- DBM;
30.Study of ADI (After Develop Inspection) On Photo Resist Wafers Using Electron Beam (II)

机译：利用电子束对光致抗蚀剂晶片进行ADI（显影检查后）的研究（II）
- 作者：Teruyuki Hayashi;Misako Saito;Kaoru Fujihara;Setsuko Shibuya;Y.Kudou;Hiroshi Nagaike;Joseph Lin;Jack Jau
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- inspection;
- photo resist;
- electron beam;
31.Critical dimension measurements on phase-shift masks using an optical pattern placement metrology tool

机译：使用光学图案放置计量工具在相移掩模上进行关键尺寸测量
- 作者：Hermann Bittner;Dieter Adam;Jochen Bender;Artur Boesser;Michael Heiden;Klaus-Dieter Roeth
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- CD measurement;
- mask pattern placement metrology;
- phase-shift masks;
32.Advances in CD-AFM Scan Algorithm Technology Enable Improved CD Metrology

机译：CD-AFM扫描算法技术的进步实现了改进的CD计量
- 作者：Lars Mininni;Johann Foucher;Pascal Faurie
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- AFM;
- critical dimension;
- metrology;
- accuracy;
- Bottom-CD;
- LER;
- LWR;
33.Thermal imaging of a lithography cell, including exposure Tool, using self-contained instrumented wafer

机译：使用独立的仪器晶圆对光刻单元（包括曝光工具）进行热成像
- 作者：Zach Reid;Mark Wiltse;Sandy Burgan;Gregory Roche
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- lithography;
- instrumented wafer;
- thermal process;
- resist dispense;
- post application bake;
- post exposure bake;
34.Optimized Molecular Contamination Monitoring for Lithography

机译：用于光刻的优化分子污染监测
- 作者：D. Rodier
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- molecular contamination;
- ion mobility;
- IMS;
- AMC;
- ammonia;
- NH3;
- sulfur dioxide;
- SO2;
35.CD-bias evaluation and reduction in CD-SEM linewidth measurements

机译：CD偏差评估和CD-SEM线宽测量结果的减少
- 作者：Maki Tanaka;Chie Shishido;Wataru Nagatomo;Kenji Watanabe
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- CD-SEM;
- shape-dependent measurement bias;
- precision;
- accuracy;
- relative accuracy;
- noise reduction;
- LER compensation;
- model-based library approach;
- monte carlo simulation;
36.Metrology of Replicated Diffractive Optics with Mueller Polarimetry in Conical Diffraction

机译：锥形衍射中具有Mueller偏振的复制衍射光学的计量学
- 作者：Tatiana Novikova;Antonello De Martino;Pavel Bulkin;Quang Nguyen;Bernard Drevillon;Vladimir Popov;Alexander Chumakov
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- polarimetry;
- scatterometry;
- diffraction;
- grating metrology;
- nanoimprinting;
37.Angular Scatterometry for Line-Width Roughness Measurement

机译：角散射法用于线宽粗糙度测量
- 作者：Deh-Ming Shyu;Yi-Sha Ku;Nigel Smith
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- angular scatterometry;
- line-width roughness;
- critical dimension;
- grating;
38.An Approach to Modeling and On-line Identification for Piezoelectric Stack Actuator

机译：压电堆驱动器建模与在线辨识的方法
- 作者：Yueyu Wang;Xuezeng Zhao;Wei Chu
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- SPM;
- piezoelectric stack actuator;
- model;
- hysteresis;
- creep;
39.Characterization and Adjustment of high performance objectives for DUV applications

机译：DUV应用的高性能物镜的表征和调整
- 作者：Stefan Mueller-Pfeiffer;Lienhard Koerner;Stefan Franz;Oliver Falkenstoerfer;Hans Lauth
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
40.Aeral93i - Aerial Imaging Mask Inspection for Immersion Lithography

机译：Aeral93i-浸没式光刻的航空成像掩模检查
- 作者：Yoel Zabar;Chaim Braude;Shmoolik Mangan;Dan Rost;Raunak Mann
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- 193nm lithography;
- hyper-NA immersion;
- masks inspection;
- aerial imaging;
- reticle defects;
- printability;
41.Novel CD-SEM calibration reference consisting of 100-nm pitch grating and positional identification mark

机译：新型CD-SEM校准参考，包括100 nm间距光栅和位置识别标记
- 作者：Yoshinori Nakayama;Hiroki Kawada;Shozo Yoneda;Takeshi Mizuno
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- grating reference;
- CD-SEM;
- EB cell projection lithography;
- silicon dry etching;
- 100-nm pitch size;
- addressing mark;
42.Plasma-Assisted Cleaning by Electrostatics (PACE)

机译：静电等离子体清洁（PACE）
- 作者：W. M. Lytle;H. Shin;D. N. Ruzic
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
43.Low Pressure Drop Filtration of Airborne Molecular Organic Contaminants Using Open-Channel Networks

机译：使用开放通道网络对机载分子有机污染物进行低压降过滤
- 作者：Andrew J. Dallas;Jon Joriman;Lefei Ding;Gerald Weineck;Kevin Seguin
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- chemical filtration;
- airborne molecular contamination;
- AMC;
- contamination control;
- low pressure drop;
- open-channel networks;
- monoliths;
- VOC removal;
44.Optimizing Surface Finishing Processes Through the Use of Novel Solvents and Systems

机译：通过使用新型溶剂和系统来优化表面处理工艺
- 作者：M. Quillen;P. Holbrook;J.Moore
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- surface finishing;
- methyl acetate;
- marangoni;
- surface tension;
45.New filter media development for effective control of trimethylsilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient

机译：新的过滤器介质开发，可有效控制光舱环境中的三甲基硅烷醇（TMS）和相关的低分子量含硅有机物
- 作者：Anatoly Grayfer;Frank V.Belanger;Phillip Cate;David Ruede
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
46.Characterization of resist thinning and profile changes using scatterometry

机译：使用散射法表征抗蚀剂变薄和轮廓变化
- 作者：Jennifer Fullam;Karen Petrillo
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- scatterometry;
- resist thinning;
- immersion lithography;
47.Scatterometry solutions and vision for advanced lithography process control

机译：散射测量解决方案和视觉技术，用于高级光刻工艺控制
- 作者：Levin Tatiana;Livne Michael;Gillespie;Robert M.
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- high volume manufacturing;
- lithography CD control;
- scatterometry;
- integrated metrology;
48.Advanced CD-AFM Probe Tip Shape Characterization for Metrology Accuracy and Throughput

机译：先进的CD-AFM探针尖端形状表征，可实现计量精度和通量
- 作者：Hao-Chih Liu;Jason R. Osbome;Marc Osborn;Gregory A. Dahlen
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- CD-AFM;
- metrology;
- characterizer;
- tip shape;
- carbon nanotube;
- throughput;
49.An Advanced AFM Sensor: Its Profile Accuracy and Low Probe Wear Property for High Aspect Ratio Patterns

机译：先进的AFM传感器：高纵横比图案的轮廓精度和低探针磨损特性
- 作者：Masahiro Watanabe;Shuichi Baba;Toshihiko Nakata;Tom Kurenuma;Yuichi Kunitomo;Manabu Edamura
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- AFM;
- depth;
- in-line;
- profile;
- high aspect ratio;
50.A new SEM CD operator verified against Monte Carlo simulations

机译：一位新的SEM CD操作员已针对Monte Carlo模拟进行了验证
- 作者：C.G. Frase;D. Gnieser;K. Dirscherl;E. Buhr;H. Bosse
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- scanning electron microscopy;
- CD-SEM;
- monte carlo;
- CD operator;
- edge detection;
51.Monitoring Airborne Molecular Contamination: a Quantitative and Qualitative Comparison of Real-time and Grab-sampling Techniques

机译：监测空气中的分子污染：实时和抓取采样技术的定量和定性比较
- 作者：Aaron M. Shupp;Dan Rodier;Steven Rowley
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- ammonia;
- sulfur dioxide;
- airborne;
- molecular;
- contamination;
- impinger;
- sorbent tube;
- real-time;
- AMC;
- IMS;
52.Contrarian Approach to and Ultimate Solution for 193nm Reticle Haze

机译：193nm光罩雾度的逆向方法和最终解决方案
- 作者：Oleg Kishkovich;Anatoly Grayfer;Frank V. Belanger
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
53.Leveraging LER to Minimize Linewidth Measurement Uncertainty in a Calibration Exercise

机译：利用LER来最小化校准练习中的线宽测量不确定度
- 作者：James Robert;Bill Banke;Ronald Dixson
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- linewidth;
- calibration;
- LER;
- measurement uncertainty;
- traceability;
- metrology;
- LWR;
- CD-AFM;
- SCCDRM;
54.Contact leakage and open monitoring with an advanced e-beam inspection system

机译：使用先进的电子束检查系统进行触点泄漏和断路监控
- 作者：Shuen-chen Lei;Hermes Liu;Mingsheng Tsai;Hung-Chi Wu;Hong Xiao;Jack Jau
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
55.Non-linear methods for overlay control

机译：叠加控制的非线性方法
- 作者：Michiel Kupers;Dongsub Choi;Boris Habets;Geert Simons;Erik Wallerbos
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- overlay;
- non-linear;
- residuals;
56.Critical dimension: MEMS road map

机译：关键尺寸：MEMS路线图
- 作者：Marc Poulingue;Nanometrics France
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- critical dimension;
- MEMS;
- optical;
57.Study on micro-bubble Defect induced by RRC Coating

机译：RRC涂层引起的微泡缺陷研究
- 作者：Yu-Huan Liu;Wen-Shiang Liao;Hsin-Hung Lin;Chin-Jung Chen;C C Huang
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- RRC coating;
- defect;
- photo resist;
58.ArF pellicle degradation mechanism for resolving CD variation

机译：ArF薄膜降解机制，用于解决CD变化
- 作者：Hyungseok Choi;Yohan Ahn;Jua Ryu;Yangkoo Lee;Bumhyun An;Seokryeol Lee
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- arf lithography;
- photomask;
- CD variation;
- transmittance;
- pellicle degradation;
59.Scatterometry measurement of nested lines, dual space, and rectangular contact CD on Phase-Shift Masks

机译：相移掩膜上的嵌套线，双空间和矩形接触CD的散射测量
- 作者：Kyung m Lee;Sanjay Yedur;Sven Henrichs;Malahat Tavassoli;Kiho Baik
- 会议名称：《Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1》 | 2007年
- scatterometry;
- PSM;
- CD metrology;
- etching;