首页> 外文会议>Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1 >New filter media development for effective control of trimethylsilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient
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New filter media development for effective control of trimethylsilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient

机译:新的过滤器介质开发,可有效控制光舱环境中的三甲基硅烷醇(TMS)和相关的低分子量含硅有机物

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The authors present results of extensive studies on the chemical behavior of low molecular weight silicon-containing species (LMWS) and associated challenges of their analytical determination and control to prevent adverse influence on critical optical elements of exposure tools. In their paper the authors describe a non-traditional approach to the creation of a TMS gaseous source for filter media development and an engineering solution to the challenge of controlling LMWS - a solution that shows a significant advantage over currently existing approaches.
机译:作者介绍了对低分子量含硅物质(LMWS)的化学行为进行广泛研究的结果,以及有关其分析测定和控制的相关挑战,以防止对曝光工具的关键光学元件产生不利影响。在他们的论文中,作者描述了创建用于过滤器介质开发的TMS气态源的非传统方法,以及应对控制LMWS挑战的工程解决方案-该解决方案显示出比现有方法更为重要的优势。

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