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Angular Scatterometry for Line-Width Roughness Measurement

机译:角散射法用于线宽粗糙度测量

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We propose using angular scatterometry as a means to investigate LWR (line-width roughness) and CD (critical dimension). The grating target is illuminated by a single wavelength light source which has large angular aperture both in incidence angle θ and azimuth angle Φ. A preliminary scatterometry model was first built by assuming perfect critical dimension printed without any line-width roughness. The difference between the model prediction and actual measurement is cased by line-width roughness contribution. We developed a calibration curve as a function of line-width roughness based on the statistical quantity of the incidence and azimuth angle dependence. The results demonstrate that scatterometry can indeed be used to extract line-width roughness and critical dimension information in production line with nano-scale resolution.
机译:我们建议使用角散射测量法来研究LWR(线宽粗糙度)和CD(临界尺寸)。光栅靶被单波长光源照射,该单波长光源的入射角θ和方位角Φ均具有大的角孔。首先通过假设完美的临界尺寸打印而没有任何线宽粗糙度来建立初步的散射测量模型。模型预测值与实际测量值之间的差异取决于线宽粗糙度的影响。我们根据入射角和方位角相关性的统计量,开发了一条线宽粗糙度函数的校准曲线。结果表明,散射测量法确实可以用于提取具有纳米级分辨率的生产线中的线宽粗糙度和临界尺寸信息。

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