首页> 外文会议>Conference on Metrology, Inspection, and Process Control for Microlithography XXI pt.1 >3D anisotropic semiconductor grooves measurement simulations (scatterometry) using FDTD Methods
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3D anisotropic semiconductor grooves measurement simulations (scatterometry) using FDTD Methods

机译:使用FDTD方法的3D各向异性半导体凹槽测量模拟(散射测量)

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In this paper, we analyze the finite-difference time-domain (FDTD) method for the anisotropic medium mounts that are put on the silicon substrate periodically. FDTD is useful for analyzing the light scattering from arbitrary shape anisotropic grooves and mounts. We consider anisotropic conductive films which have a uniaxial anisotropy, a biaxial anisotropy and off-diagonal dielectric constants tensor components. First, the FDTD formulation is obtained from Maxwell equation for the anisotropic medium. Next, we show light propagation aspects and reflection coefficients in the structure of anisotropic flat layer put on the silicon substrate. The electric field polarized in the y direction is perpendicularly emitted to the x-y plane. In this case, only the Ey scattered components appear in the isotropic medium, the uniaxial anisotropy and the biaxial anisotropy. However, we show that the Ex components also slightly appear in the off-diagonal anisotropic case, since there are off-diagonal dielectric components. The reflection coefficients are compared with the RCWA results calculated by approximating that the refractive indices are isotropy. Then, we confirmed that the anisotropy calculation is right. Finally, we calculated the reflection coefficients from the anisotropic periodic mounts put on the silicon substrate.
机译:在本文中,我们分析了周期性放置在硅衬底上的各向异性介质安装座的时域有限差分法(FDTD)。 FDTD可用于分析来自任意形状的各向异性凹槽和安装座的光散射。我们考虑具有单轴各向异性,双轴各向异性和非对角介电常数张量分量的各向异性导电膜。首先,从各向异性介质的麦克斯韦方程获得FDTD公式。接下来,我们将展示放置在硅基板上的各向异性平坦层的结构中的光传播方面和反射系数。在y方向极化的电场垂直发射到x-y平面。在这种情况下,在各向同性介质中仅出现Ey散射分量,即单轴各向异性和双轴各向异性。但是,我们显示,在非对角各向异性的情况下,Ex分量也略有出现,因为存在非对角电介质分量。将反射系数与通过近似折射率为各向同性而计算出的RCWA结果进行比较。然后,我们确认各向异性计算正确。最后,我们从放置在硅基板上的各向异性周期性安装座计算出反射系数。

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