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Conference on Photomask Technology; 20070918-21; Monterey,CA(US)

召开年：2007
召开地：Monterey,CA(US)
出版时间：-

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1.Optimizing defect inspection strategy through the use of design aware database control layers

机译：通过使用具有设计意识的数据库控制层来优化缺陷检查策略
- 作者：Dvori Stoler;Wayne Ruch;Weimin Ma;Swapnajit Chakravarty;Steven Liu;Ray Morgan;John Valadez;Bill Moore;John Burns
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- MDP;
- CATS;
- MRC;
- DRC;
- verification;
- automation;
- mask inspection;
- high resolution;
- sensitivity control layer (SCL);
- data base;
- MEEf;
2.New Method of Identification of False or Nuisance Defects Using the Defect Imaging System, DIS-05

机译：使用缺陷成像系统DIS-05识别错误或有害缺陷的新方法
- 作者：Hao Zhang;Katsuyuki Takahashi;Hideaki Bo;Yasunobu Kitayama;Akio Sugano;Kenichi Kobayashi
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- defect review;
- CD-SEM;
- mask inspection;
3.Automating Defect Disposition in Fabs and Maskshops

机译：在Fab和Maskshops中自动处理缺陷
- 作者：Peter Fiekowsky;S. Narukawa;T. Kawashima
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- mask inspection;
- disposition;
- defect specs;
- simulation;
4.Improving Inspectability with KLA-Tencor TeraScan Thin Line De-sense

机译：通过KLA-Tencor TeraScan细线去检测提高可检查性
- 作者：Chunlin Chen;David Kim;KiHun Parkv;Nam Wook Kim;Sang Hoon Han;Jin Hyung Park;Dong Hoon Chung
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- thin line de-sense;
- SRAF;
- inspectability;
- usable sensitivity;
5.Implementation of an efficient defect classification method in photomask mass production

机译：一种有效的缺陷分类方法在光掩模批量生产中的实现
- 作者：Cathy Liu;Crystal Wang;Skin Zhang;Eric Guo;Steven Liu;Eric Haodong Lu;Dongsheng Fan;Den Wang;Weiming Ma
- 会议名称：《》 | 2007年
- defect disposition;
- terascan;
- reviewsmart;
- reticle inspection;
- defect review;
- mask production;
6.To improve Reticle Re-Qualification process and reduce reticle recleaning frequency using efficient defect classification and defect tracking

机译：通过有效的缺陷分类和缺陷跟踪来改进光罩重新认证过程并降低光罩重新清洁频率
- 作者：Eric Haodong Lu;Jim Wang;Raj Badoni;Ellison Chen;Weimin Ma
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- reticle re-qualification;
- haze defect classification;
- reviewsmart;
- show change of defects;
7.Automatic OPC Repair Flow: Optimized Implementation of the Repair Recipe

机译：自动OPC维修流程：维修配方的优化实施
- 作者：Mohamed Bahnas;Mohamed Al-Imam;James Word
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC;
- virtual manufacturing;
- RET;
- OPC repair flow;
8.Database and Data Analysis Strategy for Multi-Designer Testchips

机译：多设计师测试芯片的数据库和数据分析策略
- 作者：Wojtek J. Poppe;Patrick Au;Darshana Jayasuriya;rew Neureuther
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
9.Pellicle dimensions for high NA photomasks

机译：高NA光掩模的膜片尺寸
- 作者：Frank Erber;Thomas Schulmeyer;Christian Holfeld
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- pellicle;
- inspection;
- shadowing;
- pellicle height;
- pellicle size;
- high NA lithography;
- 193nm lithography;
10.Determine OPC Target Specifications Electrically instead of Geometrically

机译：以电气方式而不是几何方式确定OPC目标规格
- 作者：Qiaolin(Charlie) Zhang;Paul van Adrichem
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC;
- OPC target specification;
- lithography;
- corner rounding;
- channel length;
- nonrectangular transistor;
- narrow gate effect;
- HSPICE;
11.Application of modified Jog-fill DRC rule on LFD OPC flow

机译：改进的Jog-fill DRC规则在LFD OPC流上的应用
- 作者：Young-Mi Kim;Sang-Uk Lee;Jea-Hyun Kang;Jea-Hee Kim;Kee-Ho Kim
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC;
- OPC-friendly pattern;
- jog-fill;
- DRC rule;
12.Evaluation of attenuated PSM photomask blanks with TF11 chrome and FEP-171 resist on a 248 nm DUV laser pattern generator

机译：在248 nm DUV激光图案发生器上评估带有TF11铬和FEP-171抗蚀剂的PSM光掩模的衰减空白
- 作者：Kezhao Xing;Charles Bjoernborg;Henrik Karlsson;Adisa Paulsson;Anna Rosendahl;Peter Beiming;Jukka Vedenpaeae;Jonathan Walford;Tom Newman
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- TFl1;
- FEP-171;
- DUV laser;
- sigma7500;
- photomask;
- laser pattern generator;
13.Bimetallic Thermal Resists Potential for Double Exposure Immersion Lithography and Grayscale Photomasks

机译：双金属热浸光刻和灰度光掩膜的双金属热阻潜力
- 作者：James M. Dykes;Calin Plesa;Chinheng Choo;Glenn H. Chapman
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- bimetallic thin-film;
- grayscale;
- photomask;
- thermal resist;
- direct-write;
- interference lithography;
- immersion lithography;
- transparency;
14.Acid Diffusion Length Limitation for 45 nm Node Attenuated and Chromeless Phase Shift Mask

机译：45 nm节点衰减和无铬相移掩模的酸扩散长度限制
- 作者：Young-Min Kang;Seung-Wook Park;Hye-Keun Oh
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- diffusion length;
- post-exposure bake;
- attenuated phase shift mask;
- chromeless phase lithography;
15.Critical Dimension Control for 32 nm Node Random Contact Hole Array with Resist Reflow Process

机译：具有电阻回流工艺的32 nm节点随机接触孔阵列的临界尺寸控制
- 作者：Joon-Min Park;Young-Min Kang;Seung-Wook Park;Joo-Yoo Hong;Hye-Keun Oh
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- resist reflow process;
- optical proximity correction;
- contact hole;
- viscosity;
- bulk effect;
16.Overcoming Loading Challenges in a Mask Etcher for 45 nm Beyond

机译：克服45 nm及以上的掩模蚀刻机中的装载挑战
- 作者：M. Chrachood;T Y B Leung;K. Yu;M.Grimbergen;S. Panayil;I. Ibrahim;A. Sabharwal;A.Kumar
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- binary mask;
- global loading;
- EASPM;
- APSM;
- CDU;
- CD bias;
- photomask etch;
- 45nm;
17.Self-aligned Resist Patterning with 172nm and 193nm Backside Flood Exposure on Attenuated Phase Shift Masks

机译：衰减相移掩模上具有172nm和193nm背面洪水泛光的自对准电阻图案
- 作者：Jun Chun;Taejoong Ha;Hoyong Jung;Sangjin Jo;Oscar Han
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- backside flood exposure;
- self-aligned resist patterning;
- photo-mask;
- transmittance;
18.Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

机译：硬掩模工艺的实际使用，以制造适用于45nm及更高节点的精细光掩模
- 作者：Yasuyuki Kushida;Hitoshi Ha;Hiroshi Maruyama;Yuuki Abe;Yukihiro Fujimura;Toshifumi Yokoyama
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- 45nm-node;
- hard-mask (HM) blanks;
- bright-field masks;
- gate-layer;
- CD;
- defect;
19.Resistless mask structuring using an ion multi-beam projection pattern generator

机译：使用离子多束投影图案生成器的无阻掩模结构
- 作者：Joerg Butschke;Mathias Irmscher;Florian Letzkus;Hans Loeschner;Lorenz Nedelmann;Elmar Platzgummer
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- mask process;
- ion beam;
- chrome;
- hard mask;
- pattern generation;
20.Pattern density and process related CD corrections at 32nm node

机译：在32nm节点处的图案密度和与工艺有关的CD校正
- 作者：Zdenek Benes;Jun Kotani
- 会议名称：《》 | 2007年
- critical dimension;
- proximity effect;
- fogging effect;
- etch loading effect;
- global process correction;
21.Reconfigurable Lithographic Applications Using Polymer Liquid Crystal Composite Films

机译：使用聚合物液晶复合膜的可重构光刻应用
- 作者：Anna E. Fox;Adam K. Fontecchio
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- H-PDLC;
- photolithography;
22.Automatic Residue Removal for High NA Extreme Illumination

机译：自动去除残留物以实现高NA极端照明
- 作者：James Moon;Byoung-Sub Nam;Joo-Hong Jeong;Dong-Ho Kong;Byung-Ho Nam;Dong Gyu Yim
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- DFM;
- OPC;
- verification;
- assist pattern;
- lithography;
23.Effective area partitioning for preparing parallel processing in mask data preparation

机译：有效区域划分，以准备掩模数据准备中的并行处理
- 作者：Yoshiyuki Satou;Yasushi Okamoto;Manabu Fujimoto;Hiroshi Tsuchida;Akiko Satou
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- parallel process;
- mask data preparation (MDP);
- MRC;
- OASIS;
24.Mask calibration dominated methodology for OPC matching

机译：OPC匹配中以掩模校准为主导的方法
- 作者：Liang Zhu;Mark Lu;Dion King;Yili Gu;Steve Yang;Lawrence S. Melvin III
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC;
- TAT;
- mask matching;
- OPC accuracy;
25.Integration of OPC and Mask Data Preparation for Reduced Data I/O and Reduced Cycle Time

机译：OPC和掩码数据准备的集成，以减少数据I / O和缩短周期时间
- 作者：Ray Morgan;Manoj Chacko;Dan Hung;Johnny Yeap;Mathias Boman
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC;
- TAT;
- mask data prep;
- MDP;
- CATS;
- proteus;
- scalability;
- RET;
- I/O;
26.Mask rule check using priority information of mask patterns

机译：使用掩码模式的优先级信息进行掩码规则检查
- 作者：Kokoro Kato;Yoshiyuki Taniguchi;Kuninori Nishizawa;Masakazu Endo;Tadao Inoue;Ryouji Hagiwara;Anto Yasaka
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
27.Improving the Efficiency of Pattern Extraction for Character Projection Lithography using OPC optimization

机译：使用OPC优化提高字符投影光刻的图案提取效率
- 作者：Hirokazu Nosato;Tetsuaki Matsunawa;Hidenori Sakanashi;Masahiro Murakawa;Testuya Higuchi
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
28.A User-programmable Link between Data Preparation and Mask Manufacturing Equipment

机译：数据准备和掩膜制造设备之间的用户可编程链接
- 作者：Weidong Zhang;Grant Davis;Emile Sahouria;Steffen Schulze;Mohammed Saad;Arae Seyfarth;Eric Poortinga
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- metrology;
- CD control;
- snapshot;
- simulation;
- aerial image;
- metrology data preparation;
- measurement;
29.32nm Half Pitch Node OPC Process Model Development for Three Dimensional Mask Effects Using Rigorous Simulation

机译：使用严格仿真为三维掩模效应开发32nm半间距节点OPC工艺模型
- 作者：Lawrence S. Melvin III;Thomas Schmoeller;Jianliang Li
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- three dimensional mask effect;
- electromagnetic field effect;
- process model;
30.OPC Verification on Cell Level Using Fully Rigorous Mask Topography Simulation

机译：使用完全严格的掩模拓扑模拟对细胞水平进行OPC验证
- 作者：Vitaliy Domnenko;Thomas Klimpel;Georg Viehoever;Hans Koop;Lawrence S. Melvin III;Thomas Schmoeller
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC verification;
- lithography simulation;
- mask topography effects;
- EMF aware OPC;
- FDTD method;
- parallel processing;
31.A Study of Haze Generation as Thin Film Materials

机译：薄雾产生的薄膜材料研究
- 作者：Ju-Hyun Kang;Han-Sun Cha;Sin-Ju Yang;Chul-Kyu Yang;Jin-Ho Ahn;Kee-Soo Nam;Jong-Min Kim;Manish Patil;Ik-Bum Hur;Sang-Soo Choi
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- haze;
- ion chromatography;
- thin film material;
- exposure;
- SO_(4~(2-));
- NH_4~+;
32.A method to determine the origin of remaining particles after mask blank cleaning

机译：掩模空白清洗后确定残留颗粒来源的方法
- 作者：Vivek Kapila;Sean Eichenlaub;Abbas Rastegar;Arun John;Pat Marmillion
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUVL;
- zeta potential;
- mask cleaning;
33.Haze generation effect by pellicle and packing box on photomask

机译：薄膜和光罩上的包装盒产生雾霾的效果
- 作者：Jong-Min Kim;Manish Patil;Woo-Gun Jeong;Ik-Boum Hur;Cheol Shin;Sung-Mo Jung;Moon-Hwan Choi;Sang-Soo Choi
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- haze;
- pellicle;
- storage package material;
- box;
- outgas;
- storage atmosphere;
- sulfate free cleaning;
34.Laser Shockwave Cleaning of EUV Reticles

机译：EUV标线的激光冲击波清洁
- 作者：N.A. Lammers;A. Bleeker
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- laser;
- shockwave;
- cleaning;
- EUV;
- reticles;
35.Mask Protection from a haze while shipping and storage

机译：面罩保护在运输和存储时免受雾霾侵害
- 作者：T. Umeda;H. Kawashima;T. Miho;K. Moriya
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- absorbent;
- storage;
- shipping;
- haze;
- chemical tight;
- ammonium sulfate;
- chemical filter;
36.Parameter Sensitive Patterns for Scatterometry Monitoring

机译：散射监测的参数敏感模式
- 作者：Jing Xue;Yu Ben;Chaohao Wang;Marshal Miller;Costas J. Spanos;rew R. Neureuther
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- scatterometry;
- ODP;
- focus;
- electric field spill over;
- interferometric probe;
37.CD-Signature evaluation Evaluation using Scatterometry

机译：CD签名评估使用散射法评估
- 作者：Jan Richter;Philipp Laube;John Lam
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- critical dimensions;
- metrology;
- reproducibility;
- cross-calibration;
- photolithographic masks;
- scatterometry;
38.Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M

机译：新型掩模CD-SEM S-9380M的长期临界尺寸测量性能
- 作者：WANG Zhigang;SEET Kock Khuen;Ritsuo Fukaya;Yasuhiro Kadowaki;Noriaki Arai;Makoto Ezumi;Hidetoshi Satoh
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- mask metrology;
- S-9380M;
- critical dimension;
- charge balance;
- ultra-violet treatment;
- long-term repeatability;
39.The study for close correlation of mask and wafer to optimize wafer field CD uniformity

机译：掩模与晶圆紧密相关以优化晶圆场CD均匀性的研究
- 作者：Munsik Kim;Jaesung Kang;Shinchul Kang;Goomin Jeong;Yongkyoo Choi;Oscar Han
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- CD;
- field CD uniformity;
- SEM;
- area CD;
- scatterometry;
- CD correction;
40.Development of a captured image simulator for the Differential Interference Contrast microscopes aiming to design 199 nm mask inspection tools

机译：开发用于差分干涉对比显微镜的捕获图像模拟器，旨在设计199 nm掩模检测工具
- 作者：Masataka Shiratsuchi;Yoshinori Honguh;Ryoichi Hirano;Riki Ogawa;Masatoshi Hirono;Takehiko Nomura
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
41.Mask CD Control (CDC) with Ultrafast Laser for Improving Mask CDU Using AIMS~TM as the CD Metrology Data Source

机译：使用AIMS〜TM作为CD计量数据源的具有超快激光的掩模CD控制（CDC）来改善掩模CDU
- 作者：Guy Ben-Zvi;Eitan Zait;Vladimir Dmitriev;Erez Graitzer;Gidi Gottlieb;Lior Leibovich;Robert Birkner;Klaus Boehm;Thomas Scheruebl
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- CD control;
- CDC;
- CDU;
- aerial imaging;
- AIMS;
- shading elements;
- ultrafast laser;
- photomask;
42.Improvements in Model-based Assist Feature Placement Algorithms

机译：基于模型的辅助特征放置算法的改进
- 作者：Benjamin Painter;Levi D. Barnes;Jeffrey P. Mayhew;Yongdong Wang
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
43.Inverse Lithography Technology (ILT) Keep the balance between SRAF and MRC at 45and 32 -nm

机译：反光刻技术（ILT）使SRAF和MRC之间的平衡保持在45和32 nm
- 作者：Linyong Pang;Yong Liu;Thuc Dam;Kresimir Mihic;Thomas Cecil;Dan Abrams
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
44.An approach of auto-fix post OPC hot spots

机译：OPC热点自动修复的方法
- 作者：Ching-HengWang;Qingwei Liu;Liguo Zhang
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- optical proximity correction (OPC);
- resolution enhancement technique (RET);
- hot spot;
- auto-fix;
45.3D Mask modeling with Oblique incidence and Mask Corner rounding effects for the 32nm node

机译：具有32nm节点的斜入射和Mask Corner舍入效果的3D Mask建模
- 作者：Mazen Saied;Franck Foussadier;Jerome Belledent;Yorick Trouiller;Isabelle Schanen;Emek Yesilada;Christian Gardin;Jean Christophe Urbani;Frank Sundermann;Frederic Robert;Christophe Couderc;Florent Vautrin;Laurent LeCam;Gurwan Kerrien;Jonathan
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- oblique incidence;
- normal incidence;
- off-axis illumination;
- abbe formulation;
- hopkins;
- corner rounding;
- OPC modeling;
46.Model-based mask verification

机译：基于模型的模板验证
- 作者：Frank Foussadier;Frank Sundermann;Anthony Vacca;Jim Wiley;George Chen;Tadahiro Takigawa;Katsuya Hayano;Syougo Narukawa;Satoshi Kawashima;Hiroshi Mohri;Naoya Hayashi;Hiroyuki Miyashita;Y. Trouiller;F. Robert;F. Vautrin;G. Kerrien;J. Plan
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC;
- modeling;
- verification;
47.More robust Model built using SEM Calibration

机译：使用SEM校准构建的更强大的模型
- 作者：Ching-HengWang;Qingwei Liu;Liguo Zhang
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
48.Fundamental study on the error factor for sub 90 nm OPC modeling

机译：90 nm以下OPC建模误差因子的基础研究
- 作者：Hyesung Lee;Sang-Uk Lee;Jeahee Kim;Keeho Kim
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- model-based OPC;
- modeling error factor;
- accuracy;
- OPC runtime;
- optical modeling;
- resist modeling;
49.Safe Interpolation Distance for VT5 Resist Model

机译：VT5抵抗模型的安全插值距离
- 作者：Walid Tawfic;Mohamed Al-Imam;George E. Bailey
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- VT5 model;
- safe interpolation distance;
- model based OPC;
50.The effect of the OPC parameters on the performance of the OPC model

机译：OPC参数对OPC模型性能的影响
- 作者：Amr Abdo;Ahmed Seoud;Alexer Wei;Ian Stobert;Alan Leslie
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- model based optical proximity correction;
- OPC setup parameters;
- OPC model performance;
51.Modeling Scanner Signatures in the Context of OPC

机译：在OPC上下文中对扫描仪签名进行建模
- 作者：Qiaolin (Charlie) Zhang;Jacek K. Tyminski;Kevin Lucas
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
52.Modeling polarized illumination for OPC/RET

机译：为OPC / RET建模偏振照明
- 作者：Hua Song;Qiaolin(Charlie) Zhang;James Shiely
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
53.OPC development in action for advanced technology nodes

机译：针对高级技术节点的OPC开发实践
- 作者：Anthony Chunqing Wang;Masashi Fujimoto;Paul.J.M. van Adrichem;Ingo Bork;Hiroshi Yamashita
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- OPC model building;
- metrology;
54.Industry Survey of Wafer Fab Reticle Quality Control Strategies in the 90nm - 45nm design-rule age

机译：90nm-45nm设计规则时代晶圆晶圆质量控制策略的行业调查
- 作者：Russell Dover
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- inspection;
- strategy;
- STARlight;
- mask defects;
- crystal growth;
- progressive defects;
- lithography;
55.Shuttle fabrication for designs with lifted I/Os

机译：I / O提升设计的穿梭制造
- 作者：Rung-Bin Lin;Meng-Chiou Wu;Shih-Cheng Tsai
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- shuttle run;
- multi-project wafer;
- mask cost;
- reticle floorplanning;
- wafer dicing;
56.Development status of EUVL mask blanks in AGC

机译：AGC中EUVL口罩毛坯的发展现状
- 作者：Kazuyuki Hayashi
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- extreme ultraviolet lithography;
- mask blank, substrate;
57.Performance of actinic EUVL mask imaging using a zoneplate microscope

机译：使用带区板显微镜的光化EUVL掩模成像性能
- 作者：Kenneth A. Goldberg;Patrick P. Naulleau;Anton Barty;Senajith B. Rekawa;Charles D. Kemp;Robert F. Gunion;Farhad Salmassi;Eric M. Gullikson;Erik H. erson;Hak-Seung Han
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- extreme ultraviolet lithography;
- EUV;
- mask inspection;
- zoneplate;
- imaging;
- actinic inspection;
58.The effect of size and shape of sub-50 nm defects on their detectability

机译：50 nm以下缺陷的大小和形状对其可检测性的影响
- 作者：Abbas Rastegar;Wonil Cho;Eric Gullikson;Sean Eichenlaub
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- defect inspection;
- mask inspection;
- lasertec M7360;
- EUV;
59.Techniques to Measure Force Uniformity of Electrostatic Chucks for EUV Mask Clamping

机译：用于测量EUV面罩夹持的静电吸盘力均匀性的技术
- 作者：Sathish Veeraraghavan;Jaewoong Sohn;Kevin T. Turner
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUV lithography;
- electrostatic chucking;
- finite element analysis;
60.A Study of precision performance and scan damage of EUV masks with the LWM9000 SEM

机译：用LWM9000 SEM研究EUV掩模的精密性能和扫描损伤
- 作者：Isao Yonekura;Hidemitsu Hakii;Takashi Yoshii;Yoshiyuki Negishi;Katsumi Oohira;Koichirou Kanayama;Masashi Kawashita;Yo Sakata;Keishi Tanaka
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUVL;
- metrology;
- precision;
- LWM9000SEM;
61.EUV mask substrate flatness improvement by laser irradiation

机译：通过激光辐照提高EUV掩模基板的平整度
- 作者：Kiwamu Takehisa;Jim Kodama;Hal Kusunose
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUVL;
- mask;
- substrate;
- flatness;
- laser;
62.Evaluation of EUVL-mask pattern defect inspection using 199-nm inspection optics

机译：使用199 nm检查光学元件评估EUVL掩模图案缺陷检查
- 作者：Tsuyoshi Amano;Yasushi Nishiyama;Hiroyuki Shigemura;Tsuneo Terasawa;Osamu Suga;Hideaki Hashimoto;Norio Kameya;Shingo Murakami;Nobutaka Kikuiri
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUVL mask;
- mask defect;
- mask inspection;
- 199nm;
- die-to-die;
- reflected illumination;
63.Study of impacts of mask structure on hole pattern in EUVL

机译：掩模结构对EUVL中孔图案的影响研究
- 作者：Nobuyuki Iriki;Yukiyasu Arisawa;Hajime Aoyama;Toshihiko Tanaka
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUVL;
- lithography simulation;
- mask structure;
- absorber;
- sidewall;
64.Repair specification study for half pitch 32-nm patterns for EUVL

机译：EUVL半间距32-nm图案的维修规范研究
- 作者：Hajime Aoyama;Tsuyoshi Amano;Yasushi Nishiyama;Hiroyuki Shigemura;Osamu Suga
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUVL;
- absorber defect;
- defect repair;
- optical constant;
- 32-nm node;
- rigorous simulation;
65.EUV Mask Process Development using DUV Inspection System

机译：使用DUV检查系统开发EUV掩模工艺
- 作者：David Kim;Venu Vellanki;William Huang;rew Cao;Chunlin Chen;Aditya Dayal;Paul Yu;KiHun Parkv Yumiko Maenaka;Kazuko Jochi;Gregg Inderhees
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- extreme ultraviolet lithography (EUVL);
- inspection;
- die-to-die;
- die-to-database;
- reflected light;
- 3x nm and below;
66.Metrology for templates of UV nano imprint lithography

机译：UV纳米压印光刻模板的计量学
- 作者：Kouji Yoshida;Kouichirou Kojima;Makoto Abe;Shiho Sasaki;Masaaki Kurihara;Hiroshi Mohri;Naoya Hayashi
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- nano imprint lithography;
- metrology;
- scanning probe microscopy;
- SEM;
- scatterometry;
67.Development of EUV mask fabrication process using Ru capping blank

机译：使用Ru盖毛坯开发EUV掩模制造工艺
- 作者：Tsukasa Abe;Takashi Adachi;Shiho Sasaki;Hiroshi Mohri;Naoya Hayashi;Kosuke Ishikiriyama
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- EUV lithography;
- EUV mask;
- etch;
- ta-based absorber;
- ru capping;
- mask fabrication. linearity;
- LER;
68.UV-NIL template for the 22nm node and beyond

机译：适用于22nm及更高节点的UV-NIL模板
- 作者：Takaaki Hiraka;Satoshi Yusa;Akiko Fujii;Shiho Sasaki;Kimio Itoh;Nobuhito Toyama;Masaaki Kurihara;Hiroshi Mohri;Naoya Hayashi
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- NIL;
- template;
- resolution;
69.A Study of Template Cleaning for Nanoimprint Lithography

机译：纳米压印光刻模板清洗的研究
- 作者：James E. Ellenson;Lloyd C. Litt;Abbas Rastegar
- 会议名称：《Conference on Photomask Technology; 20070918-21; Monterey,CA(US)》 | 2007年
- nanoimprint lithography;
- cleaning;
- nanoimprint templates;