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An approach of auto-fix post OPC hot spots

机译:OPC热点自动修复的方法

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摘要

With the design rule shrinks rapidly, full chip robust Optical Proximity Correction (OPC) will definitely need longer time due to the increasing pattern density. Furthermore, to achieve a perfect OPC control recipe becomes more difficult. For, the critical dimension of the design features is deeply sub exposure wavelength, and there is only limited room for the OPC correction. Usually very complicated fragment commands need to be developed to handle the shrinking designs, which can be infinitely complicated. So when you finished debug a sophisticated fragment scripts, you still cannot promise that the script is universal for all kinds of design. So when you find some hot spot after you apply OPC correction for certain design. The only thing you can do is to modify your fragmentation script and try to re-apply OPC on this design. But considering the increasing time that is needed for applying full chip OPC nowadays, re-apply OPC will definitely prolong the tape-out time. We here demonstrate an approach, through which we can automatically fix some simple hotspots like pinch, bridging. And re-run OPC for the full chip is not necessary now. However, this work is only the early study of the auto-fix of post OPC hot spots. There is still a long way need to go to provide a perfect solution of this issue.
机译:随着设计规则的迅速缩小,由于图案密度的增加,全芯片鲁棒的光学邻近校正(OPC)肯定需要更长的时间。此外,实现完美的OPC控制配方变得更加困难。因此,设计特征的关键尺寸是深亚曝光波长,并且OPC校正的空间非常有限。通常,需要开发非常复杂的片段命令来处理不断缩小的设计,而这可能是无限复杂的。因此,当您调试完复杂的片段脚本后,仍然不能保证该脚本对于所有类型的设计都是通用的。因此,当您对某些设计应用OPC校正后发现一些热点时。您唯一可以做的就是修改碎片脚本,并尝试在此设计上重新应用OPC。但是考虑到当今应用全芯片OPC所需的时间增加,重新应用OPC肯定会延长流片时间。我们在这里演示一种方法,通过该方法,我们可以自动修复一些简单的热点,例如捏,桥接。而且,现在无需为整个芯片重新运行OPC。但是,这项工作只是对OPC后热点自动修复的早期研究。提供此问题的完美解决方案还有很长的路要走。

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