首页> 外文会议>Conference on Photomask Technology; 20070918-21; Monterey,CA(US) >CD-Signature evaluation Evaluation using Scatterometry
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CD-Signature evaluation Evaluation using Scatterometry

机译:CD签名评估使用散射法评估

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The current abilities for active feedback loops to correct for various parameters challenge metrology groups to provide exact input data for these correction cycles. One of the most important feedback loops is the one that deals with the improvement of the CD (critical dimension) uniformity of structures. Here, several processes rely on exact metrology data to tackle systematic effects that either have to be overcome by finding better process conditions or compensated actively, for instance, by tuning the writer data.Right now most of these processes tackle long range effects on the order of millimetres and do not vary a lot on the micrometer scale. On the other hand, CD measurements are usually performed with instruments that measure single points with dimensions of a couple of micrometers (such as the conventional CD-SEM). Thus noise from the micrometer scale is introduced in the global mapping of the uniformity.Recently, numerical methods, such as the exponentially weighted penalty approach called TPS (thin plate splines) have been developed that separate between the true signatures on the millimetre scale from the noise of the micrometer measurements. In this paper, we will take one step further by showing that the acquired statistically stable CD signature of a CD-SEM measurement matches the CD data measured by a scatterometer. Furthermore, we will show that the residual of the CD data of the scatterometer measurement compared to the found TPS fit has a noise level of about 0.1 nm (3σ), which essentially equals the short-term reproducibility of the tool. This is of high importance since both methods do essentially the same - they average out micrometer noise with the only difference being that TPS does it theoretically and a scatterometer does experimentally. Thus, we have the extremely fortunate situation in which theory and experiment give the same results. Hence, two separate conclusions can be drawn: the scatterometer measures indeed stable macroscopic CD signatures and TPS is indeed the right method to extract these signatures from any given CD data.
机译:有源反馈回路校正各种参数的当前能力要求计量组为这些校正周期提供准确的输入数据。最重要的反馈回路之一是用于改善结构的CD(临界尺寸)均匀性的回路。在这里,一些流程依靠精确的计量数据来解决系统性影响,这些影响要么通过找到更好的流程条件来克服,要么通过调整写入器数据来进行主动补偿,目前大多数这些流程都应对订单的长期影响。毫米,并且在千分尺刻度上变化不大。另一方面,CD测量通常是使用尺寸为几微米的单点仪器(例如传统的CD-SEM)进行的。因此,微米尺度的噪声被引入到均匀性的全局映射中。最近,已经开发了数值方法,例如称为TPS(薄板样条)的指数加权罚分方法,该方法将毫米级的真实特征与千分尺测量的噪音。在本文中,我们将进一步证明所获得的CD-SEM测量的CD稳定统计特征与通过散射仪测量的CD数据相匹配,这将进一步向前迈进。此外,我们将显示,与发现的TPS拟合相比,散射仪测量的CD数据的残差约为0.1 nm(3σ),这基本上等于工具的短期可重复性。这非常重要,因为这两种方法实际上都相同-它们将微米级噪声平均化,唯一的区别是TPS在理论上做到了,而散射仪在实验上做到了。因此,我们有一个非常幸运的情况,其中理论和实验给出了相同的结果。因此,可以得出两个单独的结论:散射仪确实测量了稳定的宏观CD签名,而TPS确实是从任何给定CD数据中提取这些签名的正确方法。

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