机译:电路速度偏置下电热效应对n型SOI FinFET中热载流子注入的影响
Innovative Institute of Electromagnetic Information and Electronic Integration, Zhejiang Province Lab of Advanced Micro/Nano Electronic Devices and Smart Systems, College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou, China;
Innovative Institute of Electromagnetic Information and Electronic Integration, Zhejiang Province Lab of Advanced Micro/Nano Electronic Devices and Smart Systems, College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou, China;
Center for Optical and Electromagnetic Research, State Key Lab of MOI, College of Optical Science and Engineering, Zhejiang University, Hangzhou, China;
Innovative Institute of Electromagnetic Information and Electronic Integration, Zhejiang Province Lab of Advanced Micro/Nano Electronic Devices and Smart Systems, College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou, China;
FinFETs; Heating systems; Logic gates; TV; Thermal conductivity; Stress; Conductivity;
机译:电热效应对SOI MOSFET中热载流子可靠性的影响-交流与电路速度随机应力的关系
机译:热载流子注入下鳍宽度和背偏置对双栅极FinFET的影响
机译:鳍片数量对热载流子注入应力引起的整体FinFET退化的影响
机译:由于偏置温度不稳定性,热载流子注入和栅极氧化物击穿而导致基于FinFET的SRAM可靠性下降的建模
机译:SOI设备的接口特性和热载流子效应
机译:相关时间-0和热载波应力诱导FinFET参数变量:建模方法
机译:温度和注入水平的依赖性以及热氧化对p型和n型4H-SiC外延层中载流子寿命的影响
机译:用肖特基势垒的电子轰击测量N型6H siC少数载流子扩散长度