首页> 外文期刊>Microelectronics & Reliability >Influence of fin number on hot-carrier injection stress induced degradation in bulk FinFETs
【24h】

Influence of fin number on hot-carrier injection stress induced degradation in bulk FinFETs

机译:鳍片数量对热载流子注入应力引起的整体FinFET退化的影响

获取原文
获取原文并翻译 | 示例

摘要

In this paper, hot-carrier injection (HCI) stress has been used to investigate the reliability of n-channel FinFET devices with different fin numbers. Threshold voltage (VIE) shift, subthreshold swing and transconductance variation were extracted to evaluate the degradation of the device under stress. FinFET devices with fewer fins show more serious performance degradation due to hot-carrier injection stress. It is suggested that the existing of coupling effect between neighboring fins reduces the inversion charge density and equivalent electric field in multi fin devices, which causes better reliability than single-fin devices. (C) 2016 Elsevier Ltd. All rights reserved.
机译:在本文中,热载流子注入(HCI)应力已用于研究具有不同鳍数的n通道FinFET器件的可靠性。提取阈值电压(VIE)偏移,亚阈值摆幅和跨导变化,以评估器件在应力下的退化。鳍片较少的FinFET器件由于热载流子注入应力而表现出更严重的性能下降。建议相邻鳍片之间存在耦合效应,降低了多鳍片器件中的反型电荷密度和等效电场,与单鳍片器件相比,可靠性更高。 (C)2016 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Microelectronics & Reliability》 |2016年第12期|89-93|共5页
  • 作者单位

    Natl Univ Kaohsiung, Dept Elect Engn, Kaohsiung 811, Taiwan;

    Natl Kaohsiung Normal Univ, Dept Elect Engn, 62 Shenjhong Rd, Kaohsiung 824, Taiwan;

    Natl Kaohsiung Normal Univ, Dept Elect Engn, 62 Shenjhong Rd, Kaohsiung 824, Taiwan;

    Natl Univ Kaohsiung, Dept Elect Engn, Kaohsiung 811, Taiwan;

    Natl Univ Kaohsiung, Dept Elect Engn, Kaohsiung 811, Taiwan;

    Natl Kaohsiung Normal Univ, Dept Elect Engn, 62 Shenjhong Rd, Kaohsiung 824, Taiwan;

    Natl Kaohsiung Normal Univ, Dept Elect Engn, 62 Shenjhong Rd, Kaohsiung 824, Taiwan;

    Natl Kaohsiung Normal Univ, Dept Elect Engn, 62 Shenjhong Rd, Kaohsiung 824, Taiwan;

    Natl Univ Kaohsiung, Dept Elect Engn, Kaohsiung 811, Taiwan|Natl Appl Res Labs, Natl Nano Device Labs NDL, Hsinchu 300, Taiwan;

    Natl Kaohsiung Normal Univ, Dept Elect Engn, 62 Shenjhong Rd, Kaohsiung 824, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Hot-carrier injection; FinFET; Multi-fin structure; Coupling effect;

    机译:热载流子注入;FinFET;多鳍片结构;耦合效应;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号