Temperature and injection level dependencies and impact of thermal oxidation on carrier lifetimes in p-type and n-type 4H-SiC epilayers

摘要

Dependencies of temperature and injection level on carrier lifetimes in 50 μm thick p-type and n-type 4H–SiC epilayers have been investigated. The carrier lifetimes have been measured by differential microwave photoconductance decay measurements at various injection levels and temperatures. In both p-type and n-type epilayers, the carrier lifetimes gradually increased with increasing the injection level, which were naturally expected from the Shockley-Read-Hall (SRH) model, and after taking a maximum, the lifetimes dropped at the very high-injection level. In contrast, the carrier lifetimes exhibited continuous increase with elevating the temperature for both epilayers. In addition, the impact of thermal oxidation process on the carrier lifetimes has been also investigated. The thermal oxidation process, by which the Z_[1/2] and EH_[6/7] centers were remarkably reduced that had been observed in n-type 4H–SiC in our previous work, led to the improvement of the carrier lifetimes especially for n-type epilayers. The carrier lifetime reached 4.1 μs in p-type and 6.1 μs in n-type epilayers at 250 °C with an injection level of 1.8×10^[16] cm^[−3] through the thermal oxidation processing.