Photocurable chemically-amplified positive-tone ultraviolet resist for multi lithography process

摘要

A resist process via photo-nanoimprint lithography (NIL) and positive-tone ultra-violet lithography (UVL) is proposed to fabricate a resin multi-patterned microchannel that has fine dots on the bottom of the flow paths. NIL cured the resist polymer and UVL created a positive-tone pattern directly on the NIL patterns by the decomposition of the polymer. To realize the process, a photocurable positive-tone chemically amplified UV resist was prepared. By applying this resist to the process, a patterned microchannel mold can be fabricated through a simple process with high-throughput. In this paper, the mechanism and performance of the process were shown. (C) 2019 The Japan Society of Applied Physics