MicroChannel fabrication via ultraviolet-nanoimprint lithography and electron-beam lithography using an ultraviolet-curable positive-tone electron-beam resist

摘要

In this study, we propose a process to fabricate microchannels for in-situ cell cultivation and observation to facilitate a variety of biological experiments. The fabrication process involved a combination of ultraviolet nanoimprint lithography (UV-NIL) followed by electron-beam lithography (EBL) with a UV-curable EB resist polymer to form micropatterns directly on the imprinted microscale patterns. Here, we demonstrate the fabrication of microscale flow paths and reservoirs by UV-NIL and the subsequent formation of capillary flow paths and cell traps on the order of 2-4 mu m by EBL. The UV-NIL/EBL hybrid technique can be used to fabricate complex microfluidic devices and is expected to be useful for lab-on-a-chip applications that require fine and complex flow paths.