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Wafer processing method

机译:晶圆加工方法

摘要

A wafer is transferred to a holding surface of a chuck table by using a transfer unit having a suction pad. The front side of the wafer is held under suction through a protective tape on the holding surface, and the suction pad is removed from the back side of the wafer. A modified layer is formed on the back side of the wafer along division lines. The wafer is transferred by mounting the wafer held by the suction pad on the holding surface and sandwiching the wafer between the suction pad and the holding surface of the chuck table. A suction force is applied to the holding surface of the chuck table to thereby hold the front side of the wafer through the protective tape on the holding surface of the chuck table under suction, and the suction pad is then removed from the back side of the wafer.
机译:通过使用具有吸盘的传送单元将晶片传送到卡盘台的保持表面。晶片的前侧通过保持面上的保护带被吸住,从晶片的背面上取下吸盘。沿着分割线在晶片的背面上形成改性层。通过将由吸盘保持的晶片安装在保持表面上并且将晶片夹在吸盘和卡盘台的保持表面之间来传送晶片。吸力被施加到卡盘台的保持表面上,从而在吸力下通过保护带将晶片的前侧保持在卡盘台的保持表面上,然后从吸盘的背面移除吸盘。硅片。

著录项

  • 公开/公告号US9824926B1

    专利类型

  • 公开/公告日2017-11-21

    原文格式PDF

  • 申请/专利权人 DISCO CORPORATION;

    申请/专利号US201715494867

  • 发明设计人 MASARU NAKAMURA;

    申请日2017-04-24

  • 分类号H01L21/78;H01L21/683;

  • 国家 US

  • 入库时间 2022-08-21 12:55:21

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