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Two-dimensional model for subthreshold current and subthreshold swing of graded-channel dual-material doublegate (GCDMDG) MOSFETs

机译:渐变沟道双材料双栅极(GCDMDG)MOSFET的亚阈值电流和亚阈值摆幅的二维模型

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摘要

The subthreshold performance of graded-channel dual-material double-gate (GCDMDG) MOSFETs is examined through two-dimensional (2D) analytical modeling of subthreshold-current (SC) and subthreshold-swing (SS). The potential function obtained by using the parabolic approach to solve the 2D Poisson's equation, has been used to formulate SC and SS characteristics of the device. The variations of SS against different device parameters have been obtained with the help of effective conduction path parameter. The SC and SS characteristics of the GCDMDG MOS transistor have been compared with those of the dual-material double-gate (DMDG) and simple graded-channel double-gate (GCDG) MOS structures to show its better subthreshold characteristics over the latter two devices. The results of the developed model are well-agreed with the commercially available SILVACO ATLAS™ simulator data.
机译:通过亚阈值电流(SC)和亚阈值摆幅(SS)的二维(2D)分析模型,检查了渐变沟道双材料双栅极(GCDMDG)MOSFET的亚阈值性能。通过使用抛物线法求解二维Poisson方程获得的势函数已用于公式化器件的SC和SS特性。借助于有效的传导路径参数已经获得了SS相对于不同器件参数的变化。已将GCDMDG MOS晶体管的SC和SS特性与双材料双栅(DMDG)和简单梯度沟道双栅(GCDG)MOS结构的SC和SS特性进行了比较,以显示其在后两种器件中更好的亚阈值特性。开发模型的结果与市售的SILVACO ATLAS™仿真器数据完全一致。

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