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Challenges in the Assembly of Large Die, High Bump Density Pb-Free Flip Chip Packages

机译:大型模具组装挑战,高凸块密度PB无铅倒装芯片封装

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It is well established that Sn/Pb flip chip bumps tend to solder more readily than the lead free Sn/Ag bumps. Underfill process is also well understood. For a large die, typically greater than 20 mm per side, with Pb-free bumps, the wetting and spreading appears to become less effective. Due to the higher reflow temperature requirement, a Pb-free compatible no clean flux is needed. Poor compatibility between the flux residue and the underfill can lead to the formation of voids, a potential reliability concern. These new fluxes are formulated to work well with most underfill chemistries. While this is generally the case for small die size applications, these new fluxes do not always work well with large dies and high bump count. Balancing the flux effectiveness in soldering and in achieving compatibility with the underfill is one of the most difficult challenges in getting a manufacturable Pb-free process on large dies. As next generation flip chip products move into tighter bump pitch and higher bump count, the process margin challenge will remain, if not increase. The process window for the rosin and the synthetic-based fluxes typically used in Sn/Pb application is much wider than the Pb-free fluxes. For Pb-free, soldering performance is sensitive to flux thickness, reflow profile, substrate pad surface finish/topography and substrate shrinkage. Underfill flow performance varies considerably with bump layout, density and aspect ratio.
机译:很好地确定,Sn / Pb倒装芯片凸块倾向于比无铅Sn / Ag凸块更容易焊接。底部填充过程也很好地理解。对于大型模具,通常大于20毫米,每侧大于20毫米,具有无铅凸块,润湿和涂抹似乎变得较低。由于回流温度要求越高,无铅兼容不需要干净的磁通量。助焊剂残留物和底部填充物之间的相容性差可导致空隙的形成,潜在的可靠性问题。这些新的助焊剂配制起来适用于大多数底部填充化学物质。虽然这通常是小管芯尺寸应用的情况,但这些新的助焊剂并不总是用大的模具和高凹凸计数良好工作。平衡焊接的助焊剂效果和与底部填充的兼容性是在大型模具上获得可制造的无铅过程中最困难的挑战之一。由于下一代倒装芯片产品进入更紧密的凹凸间距和更高的凹凸计数,如果不增加,过程保证金挑战将仍然存在。用于松香和通常用于SN / Pb应用的合成助熔剂的过程窗口比无铅通量宽得多。对于无铅,焊接性能对磁通厚度,回流型材,基板垫表面光洁度/地形和基板收缩敏感。底部填充流动性能随着凸块布局,密度和纵横比而变化。

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