首页> 外国专利> POWER SILICON CARBIDE BASED MOSFET TRANSISTORS WITH IMPROVED SHORT CIRCUIT CAPABILITIES AND METHODS OF MAKING SUCH DEVICES

POWER SILICON CARBIDE BASED MOSFET TRANSISTORS WITH IMPROVED SHORT CIRCUIT CAPABILITIES AND METHODS OF MAKING SUCH DEVICES

机译:具有改善的短路能力的基于功率碳化硅的MOSFET晶体管及其制造方法

摘要

A power MOSFET includes a silicon carbide drift region having a first conductivity type, first and second well regions located in upper portions of the silicon carbide drift region that are doped with second conductivity dopants, and a channel region in a side portion of the first well region, an upper portion of the channel region having the first conductivity type, wherein a depth of the first well region is at least 1.5 microns and the depth of the first well region exceeds a distance between the first and second well regions.
机译:功率MOSFET包括具有第一导电类型的碳化硅漂移区,位于掺杂有第二导电性掺杂剂的碳化硅漂移区的上部中的第一阱区和第二阱区以及位于第一阱的侧部中的沟道区。区域,具有第一导电类型的沟道区域的上部,其中第一阱区域的深度至少为1.5微米,并且第一阱区域的深度超过第一和第二阱区域之间的距离。

著录项

  • 公开/公告号US2019198656A1

    专利类型

  • 公开/公告日2019-06-27

    原文格式PDF

  • 申请/专利权人 CREE INC.;

    申请/专利号US201715849975

  • 发明设计人 QINGCHUN ZHANG;ALEXANDER V. SUVOROV;

    申请日2017-12-21

  • 分类号H01L29/78;H01L29/16;H01L29/66;H01L29/08;H01L29/10;H01L21/265;

  • 国家 US

  • 入库时间 2022-08-21 12:07:39

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