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22nd Annual BACUS Symposium on Photomask Technology

召开年：2002
召开地：Monterey, CA(US);Monterey, CA(US)
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1.2002 update on the SEMI Standards Mask Qualification Terminology Task Force

机译：SEMI标准面罩合格术语工作组的2002年更新
- 作者：Rik Jonckheere
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- reticle metrology;
- reticle quality;
- pattern fidelity;
- printability;
- resolution enhancement;
2.90nm Node CD Uniformity Improvement Using a Controlled Gradient Temperature CAR PEB Process

机译：使用可控梯度温度CAR PEB工艺改善90nm节点CD均匀性
- 作者：Dong-Il Park;Soon-Kyu Seo;Eui-Sang Park;Jong-Hwa Lee;Woo-Gun Jeong;Jin-Min Kim;Sang-Soo Choi;Soo-Hong Jeong
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- chemically amplified resist;
- fogging effect;
- post exposure baking;
3.A Comparative Evaluation of Mask Production CAR Development Processes with Stepwise Defect Inspection

机译：面膜生产汽车开发工艺与缺陷逐步检验的比较评估
- 作者：Woo-Gun Jeong;Jung-Kwan Lee;Dong-Il Park;Eui-Sang Park;Jong-Hwa Lee;Sun-Kyu Seo;Dong-Heok Lee;Jin-Min Kim;Sang-Soo Choi;Soo-Hong Jeong
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- CAR;
- defects;
- dry etch;
- EBM 3500B;
- SEM;
- SLF77 TeraStar;
- ASP5000;
- fan/binary spray;
- puddle develop;
4.A Comparison of DUV Wafer and Reticle Lithography - What is the Resolution Limit?

机译：DUV晶圆和掩模版光刻的比较-分辨率极限是多少？
- 作者：Chris Spence;Cyrus Tabery;Rusty Cantrell;Les Dahl;Peter Buck;Bill Wilkinson
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
5.A Comparison of Endpoint Methods in Advanced Photomask Etch Applications

机译：先进光掩模蚀刻应用中端点方法的比较
- 作者：Dave Johnson;Jason Plumhoff;Jong Shin;Emmanuel Rausa
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
6.A GDS-based Mask Data Preparation Flow - Data Volume Containment by Hierarchical Data Processing

机译：基于GDS的遮罩数据准备流程-通过分层数据处理控制数据量
- 作者：Steffen Schulze;Pat Lacour;Peter Buck
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
7.Advanced Write Tool Effects on 100nm Node OPC

机译：高级写入工具对100nm节点OPC的影响
- 作者：Peter Buck;Kent Green;Kent Ibsen;Kent Nakagawa;Dongsung Hong;Prakash Krishnan;Dianna Coburn
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- photomask;
- mask;
- modeling;
- simulation;
- OPC;
- ALTA-4000;
- JBX-9000;
- e-beam lithography;
- optical mask lithography;
8.Aerial Image Measurement System for 157 nm Lithography

机译：157 nm光刻的航空影像测量系统
- 作者：Klaus Eisner;Peter Kuschnerus;Jan-Peter Urbach;Christof M. Schilz;Thomas Engel;Axel Zibold;Takashi Yasui;Iwao Higashikawa
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- AIMS;
- 157 nm lithography;
- photo masks;
- process window;
9.Alternating Phase Shift Mask Inspection Through the Use of Phase Contrast Enhancement Techniques

机译：通过使用相衬增强技术来交替进行相移掩模检查
- 作者：Larry Zurbrick;Maciej Rudzinski;Stan Stokowski;Long He;Kurt Kimmel;Nishrin Kashwala
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- alternating phase shift masks;
- defect inspection;
10.Alternatives to Alternating Phase Shift Masks for 65nm

机译：替代65nm的相移掩模的替代方法
- 作者：J. Andres Torres;Wilhelm Maurer
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- RET;
- 65nm technology;
- chromeless phase shift masks;
- dipole lithographyl mask specifications;
11.Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process

机译：分析标线片CD变化对100nm CMOS工艺可用工艺窗口的影响
- 作者：Staf Verhaegen;Geert Vandenberghe;Rik M. Jonckheere;Kurt R. Ronse
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- mask specifications;
- flexible mask specifications;
- OPC;
- writing grid;
- process window analysis;
- 193nm lithography;
12.Application of Cr-less mask technology for sub-100 nm gate with single exposure

机译：无铬掩模技术在单曝光以下100 nm栅极中的应用
- 作者：Sung-Hyuck Kim;Dong-Hoon Chung;Ji-Soong Park;In-Kyun shin;Seong-woon Choi;Jung- Min Sohn;Jae-Han Lee;Hye-Soo Shin;Fung Chen;Douglas Van Den Broeke
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- RET;
- CPL;
- OPC;
- PEPSM;
- KrF;
- OAI;
13.Automated Defect Severity Analysis for Binary and PSM Mask Defects

机译：二进制和PSM掩模缺陷的自动化缺陷严重度分析
- 作者：Lynn Cai;Jiunn-Hung Chen;Lin-Hsin Tu;Brian Chu;Noah Chen;T.Y. Fang;Webb Shieh
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
14.Automated flow for site definition and CD measurement with a SEM for use in mask production

机译：使用SEM在掩模生产中自动进行位置定义和CD测量的流程
- 作者：Christian Rotsch;Menning Haffner;Christian Ruebekohl;Bettine Buechner
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- photo mask;
- automation;
- CD-measurement;
- CD-SEM;
- design data flow;
- uniformity;
15.Back to Square 9, A Demonstration of 9' Reticle Capability

机译：返回第9广场，展示9英寸标线功能
- 作者：Kevin D. Cummings;Ludger Schneider-Stoermann;Ute Buttgereit;Mathias Irmscher;Dietmar Mueller;Peter Hudek;Dirk Beyer;Bernd Brendel;John Whittey;Ben Eynon;Jason Harsch;Chris Constantine;Kirk Miller
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- 9 inch reticle;
- 9 inch mask;
- 9 inch format;
- reticle capability;
16.Calibration and long-term stability evaluation of photo mask CD-SEM utilizing JQA standard

机译：使用JQA标准的光掩模CD-SEM的校准和长期稳定性评估
- 作者：Izumi Santo;Masashi Ataka;Katsuyuki Takahashi;Norimichi Anazawa
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- CD-SEM;
- standard scale;
- calibration;
- CD metrology;
- line width;
17.Characteristics of Selective MoSiON Etching in a Chlorine Plasma

机译：氯等离子体中选择性MoSiON刻蚀的特征
- 作者：Byung-Soo Chang;Dong-Soo Min;Hyuk-Joo Kwon;Boo-Yeon Choi
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- MoSiON;
- chlorine;
- selectivity;
- polymer;
18.Characterization of Repairs to KrF 300mm Wafer Printability for 0.13um Design Rule with Attenuated Phase Shifting Mask

机译：使用衰减相移掩模对0.13um设计规则对KrF 300mm晶圆可印刷性的维修特性
- 作者：William Chou;Tsung Chen;Will Tseng;Peter Huang;C.C. Tseng;Mars Chung;Dick Wang;Norman Huang
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- attenuated phase shifting mask;
- reticle;
- defect;
- repair;
19.Compensation of long-range process effects on photomasks by design data correction

机译：通过设计数据校正来补偿对光掩模的远程工艺影响
- 作者：Jens Schneider;Martin Bloecker;Gerd Ballhorn;Nikola Belic;Hans Eisenmann;Danny Keogan
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- mask process correction;
- dry etch loading;
- pattern density;
- CATS;
20.Comprehensive Approach to Determining the Specification for Mask Mean to Target

机译：确定目标掩膜均值规范的综合方法
- 作者：Sung-Woo Lee;In-Sung Kim;Jung-Hyeon Lee;Han-Ku Cho;Woo-Sung Han
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- MTT;
- uniformity;
- exposure latitude;
- MEEF;
- Arf;
21.Cr photomask etch performance and its modeling

机译：Cr光掩模蚀刻性能及其建模
- 作者：Banqiu Wu;David Chan
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- Cr;
- etch;
- plasma;
- dry etch;
- modeling;
22.Development of New Stream Format with GDSII Upper Compatibility and High-Compression Rate

机译：具有GDSII较高兼容性和高压缩率的新流格式的开发
- 作者：Koki Kuriyama;Junji Hirumi;Nobuyuki Yoshioka;Yutaka Hojo;Yuichi Kawase;Shigehiro Hara;Morihisa Hoga;Satoshi Watanabe;Masaru Inoue;Hidemichi Kawase;Tomoko Kamimoto
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
23.Electrical Dimension Characterisation of Binary and Alternating Aperture Phase-Shifting Masks

机译：二元和交替孔径相移掩模的电尺寸表征
- 作者：Martin McCallum;Stewart Smith;Alan Lissimore;Anthony J.Walton;J.Tom M. Stevenson
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
24.Electron-beam Induced Processes and their Applicability to Mask Repair

机译：电子束诱导过程及其在面膜修复中的适用性
- 作者：Volker Boegli;Hans W.P. Koops;Michael Budach;Klaus Edinger;Ottmar Hoinkis;Bemd Weyrauch;Rainer Becker;Rudolf Schmidt;Alexander Kaya;Andreas Reinhardt;Stephan Braeuer;Heinz Honold;Johannes Bihr;Jens Greiser;Michael Eisenmann
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
25.Enforcement of Mask Rule Compliance in Model-Based OPC'ed Layouts during Data Preparation

机译：在数据准备期间，在基于模型的OPC布局中实施掩码规则合规性
- 作者：Dirk Meyer;Radovan Vuletic;Alexander Seidl
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- design for manufacturability;
- model-based OPC;
- mask rule check;
- mixed integer programming;
26.Enhancement of KRS-XE for 50 keV Advanced Mask Making Applications

机译：用于50 keV高级掩模制造应用的KRS-XE的增强
- 作者：Karen Petrillo;David Medeiros;Jim Bucchignano;Marie Angelopoulos;Dario Goldfarb;Wu-Song Huang;Wayne Moreau;Robert Lang;Chester Huang;Christina Deverich;Tom Cardinali
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- chemically amplified resist;
- photomask;
- e-beam lithography;
27.EUVL Square Mask Patterning with TaN Absorber

机译：使用TaN吸收剂的EUVL方形掩模图案
- 作者：Pei-Yang Yan;Andy Ma;Yi-Chiau Huang;Brigitte Stoehr;Juan Valdivia
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- EUVL mask;
- EUV lithography;
- TaN absorber;
- TaN etch;
28.Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks

机译：评估EUVL面罩毛坯的多光束共聚焦检查系统的能力评估
- 作者：Alan Stivers;Ted Liang;Michael Penn;Barry Lieberman;Gil Shelden;Jim Folta;Cindy Larson;Paul Mirkarimi;Chris Walton;Eric Gullikson;Moonsuk Yi
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
29.Extended Defect Printability Study for 100nm Design Rule using 193nm Lithography

机译：使用193nm光刻技术对100nm设计规则进行扩展缺陷可印刷性研究
- 作者：Vicky Philipsen;Rik Jonckheere
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- defect printability;
- 193nm lithography;
- 100nm lines;
- binary reticle;
- high NA;
30.Flexible mask specifications

机译：口罩规格灵活
- 作者：Shigeki Nojima;Shoji Mimotogi;Masamitsu Itoh;Osamu Ikenaga;Shigeru Hasebe;Kohji Hashimoto;Soichi Inoue;Mineo Goto;Ichiro Mori
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- mask specifications;
- lithography simulation;
- hot spot patterns;
31.Full Phase-Shifting Methodology for 65nm Node Lithography

机译：用于65nm节点光刻的完整相移方法
- 作者：Christophe Pierrat
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- phase-shifting mask;
- double exposure;
- phase conflict;
- data conversion;
- PSM;
- OPC;
- RET;
32.Higher Anisotropy and Improved Surface Conditions for 90nm Node MoSiON ICP Dry Etch

机译：90nm节点MoSiON ICP干法刻蚀的更高各向异性和改善的表面条件
- 作者：Dong-Soo Min;Byung-Soo Chang;Hyuk-Joo Kwon;Boo-Yeon Choi
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- dry etch;
- PSM;
- MoSiON;
- CF_4 anisotropy;
33.High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition

机译：在实际生产条件下通过离子束溅射沉积生产的高性能6英寸EUV掩模坯料
- 作者：Hans Becker;Frank Sobel;Lutz Aschke;Markus Renno;Juergen Krieger;Ute Buttgereit;Guenter Hess;Frank Lenzen;Konrad Knapp;Sergey Yulin;Torsten Feigl;Thomas Kuhlmann;Norbert Kaiser
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- NGL;
- EUV;
- IBD;
- Mo/Si;
- multilayer mirrors;
- defect inspection;
34.High-Resolution Photomask Phase Measurement Tool

机译：高分辨率光掩模相位测量工具
- 作者：A. J. Merriam;J. J. Jacob
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- actinic;
- phase shift;
- photomask;
- phase shift mask;
- metrology;
- EAPSM;
- AAPSM;
35.Impact of EUV Mask Quality on Optical Inspection Sensitivity

机译：EUV掩模质量对光学检测灵敏度的影响
- 作者：Donald W. Pettibone;Aditya Dayal;Stan Stokowski
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- EUV;
- mask;
- inspection;
- defects;
36.Improvement of NLD mask dry etching system for 100nm node technology

机译：用于100nm节点技术的NLD掩模干法刻蚀系统的改进
- 作者：Yoshiyuki Tanaka;Nobuyuki Yoshioka;Noriyuki Harashima;Takaei Sasaki;Kiyoshi Kuwahara;Toshio Hayashi;Mutsumi Hara;Yasushi Ohkubo
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- NLD plasma;
- mask dry etching;
- CD uniformity;
- loading effect;
37.Improving Feature Size Linearity for Alternating Phase Shift Mask Applications Utilizing a Next Generation ICP Source

机译：利用下一代ICP源为交替相移掩模应用改善特征尺寸线性度
- 作者：J. Shin;C. Constantine;J. Plumhoff;E. Rausa
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
38.Inspecting Alternating Phase Shift Masks by Matching Stepper Conditions

机译：通过匹配步进条件来检查相移掩模
- 作者：Anja Rosenbusch;Shirley Hemar;Boaz Kenan
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- aerial-image based mask inspection;
- AAPSM;
- OPC;
- 193nm technology;
- at-wavelength inspection;
39.Integrating CD and Lithographic Process Window analysis with Mask Data Preparation for Subwavelength ICs

机译：将CD和光刻工艺窗口分析与亚波长IC的掩模数据准备集成在一起
- 作者：Devendra Joshi;Danny Keogan;James K. Falbo
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
40.Integration of Anti-reflection Coatings on EUV Absorber Stacks

机译：在EUV吸收器烟囱上集成减反射涂层
- 作者：J.R. Wasson;S-I. Han;N.V. Edwards;E. Weisbrod;W.J. Dauksher;P.J.S. Mangat;D. Pettibone
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- EUV Lithography;
- EUV Reticles;
- inspection;
- anti-reflective coatings;
41.Investigation of Nanomachining as a Technique for Geometry Reconstruction

机译：纳米加工作为几何重构技术的研究
- 作者：David Brinkley;Ron Bozak;Bin Chiu;Chanh Ly;Vikram Tolani;Roy White
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
42.Line Edge Roughness Comparison Between Wet and Dry Etched Reticles

机译：湿刻线与干刻线的线边缘粗糙度比较
- 作者：Kunal N. Taravade;Robert Muller;Susan Erichsrud
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- line edge roughness;
- wet etch;
- dry etch;
- reticles;
43.Low-defect EUVL multilayers on standard format mask blanks

机译：标准格式口罩毛坯上的低缺陷EUVL多层
- 作者：James A. Folta;Patrick A. Kearney;Cindy C. Larson;Michael K. Crosley;Emily Fisch;Kenneth C. Racette
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- extreme ultraviolet lithography;
- EUVL;
- next generation lithography;
- NGL;
- mask;
- blank;
- multilayer;
- defect;
44.Manufacturability evaluation of model-based OPC masks

机译：基于模型的OPC掩模的可制造性评估
- 作者：Sung-Hoon Jang;Sonny Y. Zinn;Won-Tai Ki;Ji-Hyun Choi;Chan-Uk Jeon;Seong-Woon Choi;Hee-Sun Yoon;Jung-Min Sohn;Yong-Ho Oh;Jai-Cheol Lee;Sungwoo Lim
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- optical proximity correction;
- model-based OPC;
45.MARS2: An Advanced Femtosecond Laser Mask Repair Tool

机译：MARS2：先进的飞秒激光口罩修复工具
- 作者：Alfred Wagner;Richard Haight;Peter Longo
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
46.Mask Error Enhancement-Factor (MEEF) metrology using automated scripts in CATS

机译：使用CATS中的自动脚本进行掩膜错误增强因子（MEEF）度量
- 作者：P.J.M. van Adrichem;F.A.J.M. Driessen;K. van Hasselt;H.-J. Brueck
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- MEEF;
- metrology automation;
- mask qualification;
- mask specification;
- new technology nodes;
47.Mask Patterning Using Chemically Amplified Resists and the Novel STEAG HamaTech Blank Coater ASR5000

机译：使用化学放大的抗蚀剂和新型STEAG HamaTech空白涂布机ASR5000进行掩模图案化
- 作者：Corinna Koepernik;Dirk Beyer;Peter Dress;Thomas Hoffmann;Peter Hudek;Mathias Irmscher;Christian Krauss;Bernd Leibold;Dietmar Mueller;Christian Reuter;Reinhard Springer;Jakob Szekeresch;Peter Voehringer
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- chemically amplified resist;
- E-beam lithography;
- resist coating;
- resist processing;
- mask making process;
48.Modified Shape From Shading Approach to SEM based Photoresist CD Metrology

机译：从遮光方法到基于SEM的光刻胶CD计量学的改进形状
- 作者：Parvez Ahammad;Amar Mukherjee
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- photo-resist;
- 3D shape reconstruction;
- semiconductor metrology;
- critical dimension metrology;
- CD-SEM;
- shape from shading;
49.Negative Chemically Amplified Resist (nCAR) for DRAM Mask Fabrications

机译：用于DRAM掩模制造的负化学增强抗蚀剂（nCAR）
- 作者：Martin Tschinkl;Christian Buergel;Uwe A. Griesinger;Barbara Jeansannetas;Armelle B. E. Vix
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- photo mask;
- blank;
- reticle;
- negative CAR (chemically amplified resist);
- process latitude;
- CD uniformity;
- cleaning;
50.New NIST Photomask Linewidth Standard

机译：新的NIST光掩模线宽标准
- 作者：James Potzick;J. Marc Pedulla;Mike Stocker
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- metrology;
- linewidth;
- photomask;
- traceability;
- standard;
51.Novel Resist Development System for Photomasks

机译：新型光阻抗蚀剂开发系统
- 作者：Masamitsu Itoh;Hideaki Sakurai;Yukihiko Esaki;Kotaro Ooishi;Kazuo Sakamoto
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- developer;
- development;
- resist;
- loading effect;
- proximity gap;
- suction;
- PGSD;
- rinse;
- scan;
52.Optimizing etch uniformity for alternating aperture phase shift masks on Etec Systems' Tetra~(TM) photomask etch system

机译：为Etec Systems的Tetra〜TM光掩模蚀刻系统上的交替孔径相移掩模优化蚀刻均匀性
- 作者：Nabila L. Waheed;Cynthia B. Brooks
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- alternating aperture phase shift masks;
- AAPSM;
- phase shift;
- glass etch;
53.Pellicle Life-Testing for High Exposure Dose Applications

机译：高暴露剂量应用的薄膜寿命测试
- 作者：Dan Schurz;Warren W. Flack
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- pellicle durability;
- high-energy exposure;
- thick photoresists;
- pellicle life-test;
- broadband exposure;
54.Performance of Proximity Gap Suction Development (PGSD)

机译：邻近间隙抽吸开发（PGSD）的性能
- 作者：Hideaki Sakurai;Masamitsu Itoh;Yukihiko Esaki;Kotaro Ooishi;Kazuo Sakamoto;Mika Nakao;Toshiharu Nishimura;Hiroyuki Miyashita;Naoya Hayashi
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- proximity;
- gap;
- suction;
- development;
- developer;
- dirty developer;
- loading effect;
- resist load;
- PGSD;
55.Performance of repaired defects and attPSM in EUV multilayer masks

机译：EUV多层掩模中已修复缺陷和atPSPSM的性能
- 作者：Yunfei Deng;Bruno La Fontaine;Andrew R. Neureuther
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
56.Phase defect repair for the chromeless phase lithography (CPL) mask

机译：无铬相位光刻（CPL）掩模的相缺陷修复
- 作者：Steven Fan;Michael Hsu;Alex Tseng;J. Fung Chen;Doug Van Den Broeke;Henrry Lei;Stephen Hsu;Xuelong Shi
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- phase shifting mask;
- PSM;
- CPL;
- AFM;
- SEM;
- FIB;
- GAE;
57.Photomask Dimensional Metrology in the SEM: Has Anything Really Changed?

机译：SEM中的光掩模尺寸计量：真的有什么变化吗？
- 作者：Michael T. Postek;Andras E. Vladar;Marylyn Hoy Bennett
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- metrology;
- SEM;
- scanning electron microscope;
- charging;
- critical dimension;
- photomask;
58.PMJ 2002 Panel Discussion Review, 'Lithography Strategy from 90- to 65-nm Nodes: ArF, F_2 or EPL?'

机译：PMJ 2002小组讨论评论，“从90纳米到65纳米节点的光刻技术：ArF，F_2或EPL？”
- 作者：Hiroyoshi Tanabe;Yoshinori Nagaoka
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- lithography strategy;
- ArF lithography;
- F_2 lithography;
- EPL;
- phase shift mask;
59.Polarization contact: mask engineering

机译：极化接触：掩模工程
- 作者：Michael Lam;Andy Neureuther
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- polarization;
- bars;
- gaps;
- mask tolerances;
- lithography;
- high NA effects;
- resist coupling;
60.Preserving EAPSM Phase and Transmission in the Clean Process

机译：在清洁过程中保持EAPSM阶段和传输
- 作者：Se-Jong Choi;Si-Yeul Yoon;Yong-Dae Kim;Hak- Weon Lee;Dae-Hong Kim;Si-Woo Lee;Dong-Heok Lee;Jin-Min Kim;Sang-Soo Choi;Soo Hong Jeong
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- megasonic cleaning;
- phase and transmission;
- embedded-attenuated phase shifting mask;
- particle;
61.PRIMADONNA: A System for Automated Defect Disposition of Production Masks Using Wafer Lithography Simulation

机译：PRIMADONNA：使用晶圆光刻技术自动对生产掩模进行缺陷处理的系统
- 作者：Dan Bald;Saghir Munir;Barry Lieberman;William H. Howard;Chris A. Mack
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
62.Process bias control with thin Cr film blanks for 90nm-node reticle fabrication

机译：用于90nm节点掩模版制造的薄Cr膜坯料的工艺偏置控制
- 作者：Yukihiro Sato;Hitoshi Handa;Yasuyuki Kushida;Satoru Asai;Hiroshi Maruyama;Yutaka Miyahara;Minoru Naito;Ryugo Hikichi;Yoji Kawasaki;Hiroyuki Miyashita;Shigeru Noguchi
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- thin Cr film blanks;
- etching bias;
- dry etching;
- ArF lithography;
63.Process monitoring of etched fused silica phase shift reticles

机译：蚀刻熔融石英相移掩模版的过程监控
- 作者：Cynthia B. Brooks;Melisa J. Buie;Nabila L. Waheed;Patrick M. Martin;Phillip Walsh;Glenn Evans
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- alternating aperture phase shift masks;
- trench depth measurement;
- broadband spectrophotometry;
- lithography;
64.Raster Shaped Beam Pattern Generation for 70 nm Photomask Production

机译：用于70 nm光掩模生产的光栅形光束图案生成
- 作者：Tom Newman;Ira Finklestein;Huei-Mei Kao;Sriram Krishnaswami;Darryn Long;Richard Lozes;Henry Pearce-Percy;Al Sagle;Jeff Varner;Stacey Winter;Mark Gesley;Frank Abboud
- 会议名称：《》 | 2002年
- MEBES;
- raster shaped beam;
- electron beam lithography;
- photomask;
- hierarchical data;
65.Recovery of Mo/Si multilayers coated LTEM substrate

机译：Mo / Si多层涂层LTEM基材的回收
- 作者：Pawitter J. S. Mangat;A. Alec Talin;A. Hooper;D. Convey;S-I. Han;J. Wasson
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- EUV lithography;
- low thermal expansion material;
- EUV blanks;
- EUV masks;
- Mo/Si multilayers;
66.Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment

机译：光罩生产环境中CD计量的可靠亚纳米级可重复性
- 作者：Andrew C. Hourd;Anthony Grimshaw;Gerd Scheming;Christian Gittinger;Stefan Doebereiner;Frank Hillmann;Hans-Juergen Brueck;Shiuh-Bin Chen;Parkson Chen;Rik Jonckheere;Vicky Philipsen;Hans Hartmann;Volodymyr Ordynskyy;Kai Peter;Thomas Schaetz
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- CD metrology;
- DUV imaging;
- 90nm node;
- 193nm EAPSM;
67.Resolution extensions in the Sigma7000 imaging pattern generator

机译：Sigma7000成像图案发生器中的分辨率扩展
- 作者：Tor Sandstrom;Niklas Eriksson
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- lithography;
- PG;
- mask;
- reticle writer;
- mask writer;
- stepper;
- scanner;
- partially coherent image;
- serifs;
- LPC;
- OPC;
- proximity correction;
68.Reticle Defect Management Solutions for a Wafer Fab

机译：晶圆厂的光罩缺陷管理解决方案
- 作者：Robert C. Muller;Glen W. Scheid;Neal Callan
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- reticle defect;
- defect classification;
- die to die inspection;
- defect disposition;
- reticle qualification;
69.Reticle defect printability: their impact on yield and feedback to suppliers

机译：标线缺陷的可印刷性：它们对产量和对供应商的反馈的影响
- 作者：Robert Vinje;Arthur D. Klaum;David Chmielewski;Matthew J. Lamantia;Dawn M. Woolery;Dianna L. Coburn;Colleen P. Weins
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- photolithography;
- reticles;
- defects;
- printability;
- yield correlation;
- positional correlation;
- feedback;
70.Sol-gel fabrication of high quality photomask substrates

机译：溶胶-凝胶法制备高质量的光掩模基材
- 作者：Rahul Ganguli;D. Laurence Meixner;Steven G. Colbern;Matt S. Gleason;Douglas E. Meyers;S. Ray Chaudhuri
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- photomask substrates;
- fused silica;
- sol-gel;
- 157 nm processing;
71.STEAG HamaTech Resist Coater ASR5000 - tool concept and process results -

机译：STEAG HamaTech Resist Coater ASR5000-工具的概念和工艺结果-
- 作者：C. Krauss;U. Dietze;F. Xu;C. Koepernik;P. Dress;P. Voehringer;M. Irmscher;J. Szekeresch
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- photoresist;
- coating;
- capillary apply;
- photomask;
- reticle;
- post coat bake;
- IP3600;
- ZEP7000;
- CAR;
- coat-on-demand;
72.Study of the Role of Cl_2, O_2, and He in the Chrome Etch Process with Optical Emission Spectroscopy

机译：用光发射光谱研究Cl_2，O_2和He在铬蚀刻过程中的作用
- 作者：Rex Anderson;Guenther Ruhl;Nicole Sandlin;Melisa Buie
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- chrome etch;
- optical emission spectroscopy;
- OES;
- endpoint detection;
- plasma diagnostics;
- terra;
- etec;
- applied materials;
- Cr;
73.The Anatomy of a Universal Data Model

机译：通用数据模型的剖析
- 作者：Thomas J. Grebinski
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- universal data model;
- OASIS;
- SEMI;
74.The Automated Management of Photomask Inspection

机译：光掩模检查的自动化管理
- 作者：J. Gordon Hughes;David Muir
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- automated photomask inspection;
- do not inspect region;
- DNIR;
- inspection plan files;
75.The influence of the baking process for chemically amplified resist on CD performance

机译：化学放大抗蚀剂的烘烤工艺对CD性能的影响
- 作者：Shiho Sasaki;Takeshi Ohfuji;Masaaki Kurihara;Hiroyuki Inomata;Curt Jackson;Yoshio Murata;Daisuke Totsukawa;Naoko Tsugama;Naoki Kitano;Naoya Hayashi;David H. Hwang
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- CAR;
- PB;
- PEB;
- CD uniformity;
- lithography;
- mask;
- bake;
- temperature;
- airflow;
76.Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL~(TM))

机译：基于无铬相位平版印刷术（CPL〜（TM））调整用于65nm节点CD控制的MEEF
- 作者：Doug Van Den Broeke;Tom Laidig;Kurt E. Wampler;Stephen Hsu;Xuelong Shi;Michael Hsu;Paul Burchard;J. Fung Chen
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- chromeless phase lithography;
- high transmission attenuated PSM;
- CPL;
- chromeless mask;
- PSM;
- mask bias factor;
- mask error enhancement factor;
- mask error factor;
- MBF;
- MEEF;
- MEf;
77.A Mask Industry Assessment: 2002

机译：口罩行业评估：2002年
- 作者：Kurt R. Kimmel
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- mask industry;
- photomask;
- industry;
- mask yield;
- photomask yield;
- mask quality;
- photomask quality;
78.Porous silica frame for deep UV lithography

机译：多孔二氧化硅镜架，用于深紫外光刻
- 作者：D. Laurence Meixner;Rahul Ganguli;Troy Robinson;De-Yin Jeng;Mark Morris;S. Ray Chaudhuri;Brian J. Grenon
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- sol-gel;
- photomask frame;
- pellicle;
- fused silica;
- porous silica;
- 157-nm processing;
79.Investigation of reticle defect formation at DUV lithography

机译：在DUV光刻中标线片缺陷形成的研究
- 作者：Kaustuve Bhattacharyya;William Volk;Brian Grenon;Darius Brown;Javier Ayala
- 会议名称：《22nd Annual BACUS Symposium on Photomask Technology》 | 2002年
- DUV;
- PSM;
- mask contamination;
- mask;
- crystal-growth;
- cyanuric acid;
- pellicle;
- 193nm;
- scanner;
- STARlight;