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Recent studies on photoelectron and secondary electron yields of TiN and NEG coatings using the KEKB positron ring

机译:使用KEKB正电子环对TiN和NEG涂层的光电子和二次电子产率的最新研究

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In order to obtain a method to suppress electron-cloud instability (ECI), the photoelectron and the secondary electron yields (PEY and SEY) of a TiN coating and an NEG (Ti-Zr-V) coating on copper have been studied so far by using the KEK B-factory (KEKB) positron ring. Recently, test chambers with these coatings were installed at a straight section of the ring where the irradiated photon density was considerably smaller than that at the arc section of a previous experiment. The number of electrons around beams was measured by an electron current monitor; this measurement was performed up to a stored beam current of approximately 1700mA (1389 bunches). For the entire range of the beam current, the electron currents of the NEG-coated and the TiN-coated chambers were clearly smaller as compared to those of the uncoated copper chamber by the factors of 2-3 and 3-4, respectively. The small photon density, that is, the weak effect of photoelectrons, elucidated the differences in the SEYs of these coatings when compared to the measurements at the arc section. By assuming almost the same PEY (η_e) values obtained in the previous study, the maximum SEY (δ_(max)) for the TiN and NEG coatings and the copper chamber was again estimated based on a previously developed simulation. The evaluated δ_(max) values for these three surfaces were in the ranges of 0.8-1.0, 1.0-1.15, and 1.1-1.25, respectively. These values were consistent with the values obtained so far. As an application of the simulation, the effective η_e, η_(e-eff) (which included the geometrical effect of the antechamber) and δ_(max) values were also estimated for copper chambers with one or two antechambers. These chambers were installed in an arc section and a wiggler section, respectively. The evaluated η_(e-eff) and δ_(max) values were approximately 0.008 and 1.2, and 0.04 and 1.2, respectively, where η_e = 0.28 was assumed on the side wall. As expected, the η_(e-eff) values were considerably smaller than those obtained in the case of a simple circular chamber (η_e = 0.28-0.3). Further, the δ_(max) values were consistent with those obtained so far. With regard to the uncertainty in the simulation, the effect of the SEY spectrum on the estimation of δ_(max) values is briefly discussed. As the next step in our study, we plan to combine beam ducts with antechambers and TiN coatings; this combination is the most promising solution to ECI at present.
机译:为了获得抑制电子云不稳定性(ECI)的方法,到目前为止,已经研究了铜上TiN涂层和NEG(Ti-Zr-V)涂层的光电子和二次电子产率(PEY和SEY)通过使用KEK B工厂(KEKB)正电子环。最近,将具有这些涂层的测试室安装在环的笔直部分,该部分的照射光子密度远小于先前实验的弧形部分。束周围的电子数通过电子电流监测器测量。进行此测量直至存储的电子束电流约为1700mA(1389束)。对于束电流的整个范围,与未涂覆的铜腔室相比,NEG涂覆的腔室和TiN涂覆的腔室的电子电流明显较小,分别为2-3和3-4倍。小的光子密度,即光电子的弱效应,说明了与电弧部分的测量结果相比,这些涂层的SEY的差异。假设以前的研究中获得的PEY(η_e)值几乎相同,则基于先前开发的模拟再次估算TiN和NEG涂层以及铜室的最大SEY(δ_(max))。这三个表面的δ_(max)评估值分别在0.8-1.0、1.0-1.15和1.1-1.25的范围内。这些值与到目前为止获得的值一致。作为模拟的应用,还针对具有一个或两个前室的铜制腔室,估算了有效η_e,η_(e-eff)(包括前室的几何效应)和δ_(max)值。这些室分别安装在弧形部分和摆动器部分中。评估的η_(e-eff)和δ_(max)值分别约为0.008和1.2,以及0.04和1.2,其中在侧壁上假设η_e= 0.28。正如预期的那样,η_(e-eff)值明显小于在简单圆形腔室中获得的值(η_e= 0.28-0.3)。此外,δ_(max)值与迄今为止获得的值一致。关于仿真中的不确定性,简要讨论了SEY谱对δ_(max)值估计的影响。作为我们研究的下一步,我们计划将束导管与前室和TiN涂层相结合。这种结合是目前ECI最有希望的解决方案。

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