首页> 外文会议>IEEE Particle Accelerator Conference >CONTINUED STUDY ON PHOTOELECTRON AND SECONDARY ELECTRON YIELDS OF TIN AND NEG (Ti-Zr-V) COATINGS AT THE KEKB POSITRON RING
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CONTINUED STUDY ON PHOTOELECTRON AND SECONDARY ELECTRON YIELDS OF TIN AND NEG (Ti-Zr-V) COATINGS AT THE KEKB POSITRON RING

机译:KEKB正电子环上的光电子和二次电子产量的光电子和二次电子产量研究

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摘要

The photoelectron and secondary electron yields of a TiN coating and a NEG (Ti-Zr-V) coating on copper have been studied so far by using the KEK B-Factory (KEKB) positron ring. Recently, test chambers with these coatings were installed at a straight section of the ring, where the irradiated photon density was considerably smaller than that at an arc section in the previous experiments. The number of electrons around beams in the NEG-coated and the TiN-coated chambers were clearly smaller as compared to those of the uncoated copper chamber by the factors of 2-3 and 3-4, respectively. The evaluated maximum SEY (δ{sub}(max)) for the TiN coating and the NEG coating and the copper were in the ranges of 0.8-1.0, 1.0-1.15, and 1.1-1.25, respectively. As an application of the simulation, δ{sub}(max) values and the effective photoelectron yield including the geometrical effect were also estimated for copper chambers with one or two antechambers.
机译:到目前为止,通过使用KEK B-Boute(Kekb)正电子环,研究了铜涂层的光电子和铜(Ti-Zr-V)涂层的铜(Ti-Zr-V)涂层。最近,具有这些涂层的测试室被安装在环的直线部分,其中辐照光子密度显着小于先前实验中的电弧部分处的。与未涂覆的铜室的因子分别通过2-3和3-4的因子相比,负涂层和锡涂覆的腔室中的梁周围的电子数显然。用于锡涂层和NON涂层和铜的评价的最大SEY(Δ{Sub}(MAX)分别为0.8-1.0,1.0-1.15和1.1-1.25的范围。作为仿真的应用,对于具有一个或两个AnteChambers的铜室,还估计包括几何效果的Δ{Sub}(MAX)值和有效的光电子产量。

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