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Designing for reliability using a new Wafer Level Package structure

机译:使用新的晶圆级封装结构进行可靠性设计

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摘要

Wafer Level Packages are one of the most advanced packaging concepts. It combines the advantages of flip chip with conventional surface mount technologies. In recent years, we have seen a tremendous growth in the application of Wafer Level Packages, both in quantities as well as in the number of products where they are implemented. The technology is, however, not without it is challenges with 1st and 2nd level reliability issues. For instance, the limit on the size of Wafer Level Packages has to do with the 2nd level, or solder bump, reliability. This paper highlights our major research and development results on understanding and enhancing the 1st and 2nd level reliability of Wafer Level Packages using combined experimental and virtual prototyping (thermal, mechanical and thermo-mechanical) techniques. Typical 1st level reliability problems within Wafer Level Packages are cracking of repassivation materials, fatigue of bond over active pads, and cracks within the Under Bump Metalisation. Typical 2nd level problems concern solder fatigue and brittle fractures within the intermetallics. To investigate the physics of failure for these problems, dedicated parametric finite element models are constructed including the thin IC layers. Two structures are explored to their potential reliability benefits, being the traditionally used repassivation structure and a newly developed Bump on Active structure. This so-called BUMA structure makes use of a thick Al buffer layer. By combining the experimental results with reliability prediction models, both structures in terms of 1st and 2nd level reliability performance are explored. Based on the results we have designed and manufactured an improved construction that significantly outperforms current solutions.
机译:晶圆级封装是最先进的封装概念之一。它结合了倒装芯片的优势和传统的表面贴装技术。近年来,我们在晶圆级封装的应用方面实现了巨大的增长,无论在数量上还是在实现它们的产品数量上都如此。但是,该技术并非没有挑战第一和第二级可靠性。例如,晶圆级封装尺寸的限制与第二级或焊锡凸点的可靠性有关。本文重点介绍了我们在结合使用实验和虚拟样机(热,机械和热机械)技术来理解和增强晶圆级封装的第一级和第二级可靠性方面的主要研究和开发成果。晶圆级封装中典型的第一级可靠性问题是再钝化材料开裂,有源焊盘上的粘结疲劳以及凸点下金属化内的裂纹。典型的二级问题涉及金属间化合物内的焊料疲劳和脆性断裂。为了研究这些问题的失效机理,构建了专用的参数有限元模型,其中包括薄的IC层。探究了两种结构的潜在可靠性优势,即传统使用的钝化结构和新开发的Active Bump。这种所谓的BUMA结构利用了厚的Al缓冲层。通过将实验结果与可靠性预测模型相结合,探讨了第一级和第二级可靠性性能的结构。根据结果​​,我们设计并制造了一种改进的结构,其性能明显优于现有解决方案。

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  • 来源
    《Microelectronics reliability》 |2010年第4期|p.528-535|共8页
  • 作者单位

    NXP Semiconductors, Gerstweg 2, 6534AE Nijmegen, The Netherlands;

    NXP Semiconductors, Gerstweg 2, 6534AE Nijmegen, The Netherlands Detft University of Technology, P.O. Box 5033. 2600 GA, Delft. The Netherlands;

    NXP Semiconductors, Gerstweg 2, 6534AE Nijmegen, The Netherlands;

    Detft University of Technology, P.O. Box 5033. 2600 GA, Delft. The Netherlands;

    NXP Semiconductors, Gerstweg 2, 6534AE Nijmegen, The Netherlands;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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