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Physical subthreshold MOSFET modeling applied to viable design of deep-submicrometer fully depleted SOI low-voltage CMOS technology

机译:物理亚阈值MOSFET建模应用于深亚微米全耗尽SOI低压CMOS技术的可行设计

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An insightful study of the subthreshold characteristics of deep-submicrometer fully depleted SOI MOSFET's, based on two-dimensional numerical (PISCES) device simulations, shows that the gate swing and off-state current are governed by gate bias-dependent source/drain charge sharing, which controls back-channel as well as front-channel conduction. The insight from this study guides the development of a physical, two-dimensional analytic model for the subthreshold current and charge, which is linked to our strong-inversion formalism in SOISPICE for circuit simulation. The model is verified by PISCES simulations of scaled devices. The utility of the model in SOISPICE is demonstrated by using it to define a viable design for deep-submicrometer fully depleted SOI CMOS technology based on simulated speed and static power in low-voltage digital circuits.
机译:根据二维数值(PISCES)器件仿真,对深亚微米完全耗尽SOI MOSFET的亚阈值特性进行的深入研究表明,栅极摆幅和截止状态电流受栅极偏置相关的源极/漏极电荷共享的支配,它控制后通道和前通道的传导。这项研究的见解指导了亚阈值电流和电荷的物理二维分析模型的开发,该模型与我们在SOISPICE中用于电路仿真的强反形式化联系在一起。该模型通过缩放设备的PISCES仿真进行了验证。通过使用该模型定义低压数字电路中基于模拟速度和静态功率的深亚微米全耗尽SOI CMOS技术的可行设计,证明了该模型在SOISPICE中的实用性。

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