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Extraction of Density of States in Amorphous GaInZnO Thin-Film Transistors by Combining an Optical Charge Pumping and Capacitance–Voltage Characteristics

机译:结合光电荷泵浦和电容-电压特性提取非晶GaInZnO薄膜晶体管中的状态密度

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摘要

A technique for extracting the acceptorlike density of states (DOS) of $n$ -channel amorphous GaInZnO (a-GIZO) thin-film transistors based on the combination of subbandgap optical charge pumping and $C$– $V$ characteristics is proposed. While the energy level is scanned by the photon energy and the gate voltage sweep, its density is extracted from the optical response of $C$–$V$ characteristics. The extracted DOS shows the superposition of the exponential tail states and the Gaussian deep states ($N_{rm TA} = hbox{2} times hbox{10}^{18} hbox{eV}^{-1} cdot hbox{cm}^{-3}$, $N_{rm DA} = hbox{4} times hbox{10}^{15} hbox{eV}^{-1} cdot hbox{cm}^{-3}$, $kT_{rm TA} = hbox{0.085} hbox{eV}$, $kT_{rm DA} = hbox{0.5} hbox{eV}$ , $E_{O} = hbox{1} hbox{eV}$). The TCAD simulation results incorporated by the extracted DOS show good agreements with the measured transfer and output characteristics of a-GIZO thin-film transistors with a single set of process-controlled parameters.
机译:提出了一种基于子带隙光电荷泵浦和$ C $ – $ V $特性组合的$ n $沟道非晶GaInZnO(a-GIZO)薄膜晶体管的类受体密度(DOS)提取技术。当通过光子能量和栅极电压扫描来扫描能级时,其密度是从$ C $ – $ V $特性的光学响应中提取的。提取的DOS显示指数尾态和高斯深态的叠加($ N_ {rm TA} = hbox {2}乘以hbox {10} ^ {18} hbox {eV} ^ {-1} cdot hbox {cm } ^ {-3} $,$ N_ {rm DA} = hbox {4}乘以hbox {10} ^ {15} hbox {eV} ^ {-1} cdot hbox {cm} ^ {-3} $,$ kT_ {rm TA} = hbox {0.085} hbox {eV} $,$ kT_ {rm DA} = hbox {0.5} hbox {eV} $,$ E_ {O} = hbox {1} hbox {eV} $)。提取的DOS合并的TCAD仿真结果表明,与具有一组过程控制参数的a-GIZO薄膜晶体管的测量的传输和输出特性相吻合。

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