首页> 外文会议>International meeting on information display;International display manufacturing conference and Asia display;IMID/IDMC/Asia Display 2010 >Device Characterization starting from Quasi-Static Capacitance-Voltage Characteristics for Thin-Film Transistors- Low- and High-Temperature Poly-Si, Amorphous In-Ga-Zn-O, ZnO, Polymer -
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Device Characterization starting from Quasi-Static Capacitance-Voltage Characteristics for Thin-Film Transistors- Low- and High-Temperature Poly-Si, Amorphous In-Ga-Zn-O, ZnO, Polymer -

机译:器件特性从薄膜晶体管的准静态电容电压特性开始-低温和高温多晶硅,非晶In-Ga-Zn-O,ZnO,聚合物-

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摘要

Device characterization starting from quasi-static C-V characteristics has been applied to LTPS, HTPS, a-IGZO, ZnO and polymer TFTs with appropriate assumptions. Trap densities in film and at interfaces, carrier mobility as a function of carrier density, process dependence, uniformity, degradation, etc. are discussed. It can be a common evaluation technique for all kinds of TFTs.
机译:从准静态C-V特性开始的器件表征已在适当的假设下应用于LTPS,HTPS,a-IGZO,ZnO和聚合物TFT。讨论了膜中和界面处的陷阱密度,载流子迁移率与载流子密度,工艺依赖性,均匀性,退化等的关系。对于所有类型的TFT来说,它都是一种常见的评估技术。

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