首页> 外文会议>International meeting on information display >Device Characterization starting from Quasi-Static Capacitance-Voltage Characteristics for Thin-Film Transistors- Low- and High-Temperature Poly-Si, Amorphous In-Ga-Zn-O, ZnO, Polymer -
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Device Characterization starting from Quasi-Static Capacitance-Voltage Characteristics for Thin-Film Transistors- Low- and High-Temperature Poly-Si, Amorphous In-Ga-Zn-O, ZnO, Polymer -

机译:从薄膜晶体管的准静态电容 - 低温和高温聚-Si,无定形In-Zn-O,ZnO,聚合物 -

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摘要

Device characterization starting from quasi-static C-V characteristics has been applied to LTPS, HTPS, a-IGZO, ZnO and polymer TFTs with appropriate assumptions. Trap densities in film and at interfaces, carrier mobility as a function of carrier density, process dependence, uniformity, degradation, etc. are discussed. It can be a common evaluation technique for all kinds of TFTs.
机译:从准静态C-V特性开始的器件表征已应用于LTPS,HTPS,A-IgZO,ZnO和具有适当假设的聚合物TFT。介绍薄膜和界面的捕获密度,讨论了作为载流子密度,过程依赖性,均匀性,劣化等的函数的载流子迁移率。它可以是各种TFT的共同评估技术。

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