首页> 外文会议>Proceedings of the printed circuit world convention >Planning for Implementation of Positive Liquid Inner Layer Photoresists
【24h】

Planning for Implementation of Positive Liquid Inner Layer Photoresists

机译:正液体内层光刻胶的实施规划

获取原文

摘要

Planning forImplementation of Positive Liquid Inner Layer Photoresists Positive working photoresists have already long been dominant in the manufacture of semiconductor devices, and have replaced negative working resists due to the improved lithographic performance. Motivated by a need to reduce manufacturing costs, positive working liquid resist are now finding increasing use in the manufacture of Printed Wiring Boards, in particular for innerlayers. Proper planning for the implementation of positive liquid photoresist in an innerlayer production process, is an essential condition for success. The complete photo imaging process, i.e. from copper clad quality and cleaning, through resist application and drying, the exposure, development, etching and stripping process, inclusive the necessary production equipment, phototools, and the involved personnel, has to be at optimum performance for best production results. These results are typically expressed by the 'First-Pass-Yields' (FPY). A FPY of 80
机译:正液体内层光致抗蚀剂的实施计划正性光致抗蚀剂在半导体器件的制造中一直占据主导地位,并且由于光刻性能的提高,已经取代了负性光致抗蚀剂。由于需要降低制造成本,因此正性工作液体抗蚀剂在印刷线路板(尤其是内层)的制造中正得到越来越多的使用。正确计划在内层生产过程中实施液态正光致抗蚀剂是成功的必要条件。完整的照片成像过程(即从覆铜质量和清洁到抗蚀剂的施加和干燥,曝光,显影,蚀刻和剥离过程,包括必需的生产设备,照相工具和相关人员)必须处于最佳性能,以确保最佳生产结果。这些结果通常由“首批合格率”(FPY)表示。 FPY 80

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号