Abstract: Toshiba and Toshiba Machine have developed an advancedelectron beam writing system EX-11 for next-generationmask fabrication. EX-11 is a 50 kV variable-shaped beamlithography system for manufacturing 4x masks for 0.15- 0.18 micrometer technology generation. Manybreakthroughs were studied and applied to EX-11 to meetfuture mask-fabrication requirements, such as criticaldimension and positioning accuracy. We have verifiedthe accuracy required for 0.15 - 0.18 micrometergeneration. !19
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