首页> 外文会议>Indium Phosphide and Related Materials, 1998 International Conference on >Suppression of carrier accumulation at the epilayer/substrate interface of InSb grown on GaAs and InP
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Suppression of carrier accumulation at the epilayer/substrate interface of InSb grown on GaAs and InP

机译:在GaAs和InP上生长的InSb的外延层/底物界面处的载流子积累的抑制

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Carrier accumulation at the heterointerface of InSb/substrate was investigated. Various surface indexes of the zinc-blende structure lattice were used as substrate for InSb growth and carrier concentration dependence on these indexes was recognized. This concentration increased in proportion to the dangling bond density, and the suppression of this accumulation was successfully performed by using a (111) interface, which had the lowest dangling bond density among all the surface indexes.
机译:研究了INSB /底物的异常表面处的载体积累。使用锌 - 混合结构晶格的各种表面索引用作用于INSB生长的底物,并识别出这些指标的载体浓度依赖性。这种浓度与悬空粘合密度成比例地增加,通过使用(111)界面成功地进行了该积累的抑制,所述界面在所有表面指标中具有最低悬空粘合密度的悬垂密度。

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