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Effect of thermal annealing on carrier localization and efficiency of spin detection in GaAsSb epilayers grown on InP

机译:热退火对InP上生长的GaAsSb外延层中载流子定位和自旋检测效率的影响

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The effect of the thermal annealing on the optical and spin properties in GaAs0.44Sb0.56 epilayers grown on InP was investigated via photoreflectance, power-dependent and time-resolved photoluminescence spectroscopy as well as optical orientation measurement. The carrier’s localization and the optical spin detection efficiency increase with an increase of annealing temperature up to 600 °C. The enhancement of the spin detection efficiency is attributed to both the shortening of the electron lifetime and the prolonging of the spin lifetime as a result of the enhanced carriers’ localization induced by the annealing process. Our results provided an approach to enhance spin detection efficiency of GaAsSb with its PL emission in the 1.55 μm region.
机译:通过光反射,功率相关和时间分辨光致发光光谱研究了热退火对在InP上生长的GaAs 0.44 Sb 0.56 外延层中光学和自旋性能的影响,方法如下:以及光学方向测量。随着退火温度升高到600°C,载流子的定位和光学自旋检测效率也随之提高。自旋检测效率的提高归因于电子寿命的缩短和自旋寿命的延长,这归因于退火过程引起的载流子定位的增强。我们的结果提供了一种方法,可通过在1.55μm范围内的PL发射来增强GaAsSb的自旋检测效率。

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