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Investigation of Localized States in GaAsSb Epilayers Grown by Molecular Beam Epitaxy

机译:分子束外延生长GaAsSb外延层中的局部状态研究

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摘要

We report the carrier dynamics in GaAsSb ternary alloy grown by molecular beam epitaxy through comprehensive spectroscopic characterization over a wide temperature range. A detailed analysis of the experimental data reveals a complex carrier relaxation process involving both localized and delocalized states. At low temperature, the localized degree shows linear relationship with the increase of Sb component. The existence of localized states is also confirmed by the temperature dependence of peak position and band width of the emission. At temperature higher than 60 K, emissions related to localized states are quenched while the band to band transition dominates the whole spectrum. This study indicates that the localized states are related to the Sb component in the GaAsSb alloy, while it leads to the poor crystal quality of the material, and the application of GaAsSb alloy would be limited by this deterioration.
机译:我们报告了通过广泛的温度范围内的综合光谱表征分子束外延生长的GaAsSb三元合金中的载流子动力学。对实验数据的详细分析揭示了一个复杂的载流子弛豫过程,涉及局部和离域状态。在低温下,局部化程度与Sb组分的增加呈线性关系。局部状态的存在还通过峰位置和发射带宽的温度依赖性来确认。在高于60 K的温度下,与局部态有关的发射被猝灭,而带到带的跃迁则主导了整个光谱。这项研究表明,GaAsSb合金中的局域态与Sb成分有关,而这会导致材料的晶体质量差,因此这种劣化会限制GaAsSb合金的应用。

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