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Distribution of dislocations in GaSb and InSb epilayers grown on GaAs (001) vicinal substrates

机译:在GaAs(001)邻近衬底上生长的GaSb和InSb外延层中位错的分布

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摘要

GaSb and InSb epilayers grown on GaAs (001) vicinal substrates misoriented toward (111) plane were studied using high resolution x-ray diffraction. The results show that GaSb and InSb epilayers take on positive crystallographic tilt, and the asymmetric distribution of 60° misfit dislocations in {111} glide planes have an effect on the tilt. In addition, the vicinal substrate influences the distribution of the threading dislocations in {111} glide planes, and the density of dislocation in the (111) plane is higher than in the (111) plane. A model was proposed to interpret the distribution of full width at half maximum, which can help us understand the formation and glide process of the dislocations.
机译:使用高分辨率x射线衍射研究了在GaAs(001)邻近衬底上取向不正确的(111)平面上生长的GaSb和InSb外延层。结果表明,GaSb和InSb外延层具有正的晶体学倾斜度,{111}滑行面中60°失配位错的不对称分布对倾斜度有影响。另外,邻近基底影响{111}滑行平面中的螺纹位错的分布,并且(111)平面中的位错密度高于(111)平面中的位错密度。提出了一个模型来解释半峰全宽的分布,这可以帮助我们理解位错的形成和滑动过程。

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  • 来源
    《Journal of Applied Physics》 |2009年第9期|1154-1157|共4页
  • 作者单位

    School of Materials Science and Engineering, Harbin Institute of Technology, P.O. Box 405, Harbin 150001, China;

    School of Materials Science and Engineering, Harbin Institute of Technology, P.O. Box 405, Harbin 150001, China;

    Changchun University of Science and Technology, Changchun, 130022 China;

    Institute of Semiconductors, CAS, Beijing, 100000 China;

    Changchun University of Science and Technology, Changchun, 130022 China;

    School of Materials Science and Engineering, Harbin Institute of Technology, P.O. Box 405, Harbin 150001, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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