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Copper Pillar Bump Structure Optimization for Flip Chip Packaging with Cu/Low-K Stack

机译:用Cu / Low-K堆叠的倒装芯片包装铜柱凸块结构优化

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Copper pillar bumping is a promising solution to cope with the challenges which flip chip packages face when bump pitch size keep shrinking. A large FCBGA (flip chip ball grid array) package for 45nm Cu/Low-K device with Cu pillar bumps is chosen to investigate the package reliability. Finite element models have been built with multi-level sub-modeling technique to consider the detailed Cu/Low-K structure in the chip. Comparison on Cu pillar bumps vs. solder bumps shows the former bump type generated about 20~30% higher stress on Cu/lowK structure. Thus package reliability may become a concern when Cu pillar is used. To improve the package reliability, design optimization is carried out on Cu pillar bump structure. DOE (design of experiment) study is done on the following factors: Cu pillar height, PI (polyimide) passivation opening and PI thickness etc. Loading is considered for both post flip chip attach process (reflow) and after full assembly (curing). It is found that the stress in post flip chip attach process is much higher than that after full assembly. For Cu/low-K devices, special care is needed for flip chip attach process. Stress on Cu/low-K interface has been analyzed in detail, and it is shown that the interface stress pattern is highly dependent on UBM structure design, especially PI opening and thickness. An overall picture of the PI effect is presented based on optimization results. Lower Cu pillar height, smaller PI opening and higher thickness are recommended for bump structure design.
机译:铜柱撞击是一种承诺的解决方案,可以应对撞击芯片封装面的挑战,当凸起间距尺寸保持缩小时倒装芯片包装。选择具有Cu柱凸块的45nm Cu / Low-K器件的大型FCBGA(倒装芯片球栅阵列)封装,以研究包装可靠性。采用多级子建模技术构建了有限元模型,以考虑芯片中的详细CU / Low-K结构。 Cu Parkar凸块与焊料凸块的比较显示了前凸块型在Cu / Lowk结构上产生了约20〜30%的压力。因此,当使用Cu柱时,包装可靠性可能成为一个问题。为了提高包装可靠性,在Cu柱凸块结构上进行设计优化。 DOE(实验设计)研究是对以下因素进行的:Cu柱高度,PI(聚酰亚胺)钝化开口和PI厚度等。用于倒装芯片附着工艺(回流)和完全组装(固化)后,也考虑负载。发现POST倒装芯片附着过程中的应力远高于完全组装后的压力。对于CU / LOW-K器件,倒装芯片附加过程需要特别小心。已经详细分析了Cu / Low-K接口的应力,并显示了界面应力模式高度依赖于UBM结构设计,尤其是PI开口和厚度。基于优化结果提出了PI效应的整体图像。建议为凹凸结构设计推荐较低的Cu柱高度,较小的PI打开和更高的厚度。

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