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Effect of a thick buffer in the OFF state simulation of AlGaN/GaN HEMT

机译:厚缓冲层在AlGaN / GaN HEMT的OFF状态模拟中的作用

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Study of the buffer thickness dependence of the OFF state characteristics of AlGaN/GaN HEMTs has been attempted. The buffer conduction in OFF state has been studied taking into account the effect of buffer traps and the response of those traps under varying Source-Drain voltage in both the pre-breakdown and near breakdown regions. The temperature dependence of the current-voltage characteristics have been addressed and related to the trap occupancy as a function of voltage and temperature. A quantitative measure of the trap concentration has been estimated to observe the expected device characteristics without any artifacts introduced by the buffer.
机译:已经尝试研究AlGaN / GaN HEMT的截止状态特性的缓冲厚度依赖性。已经研究了关断状态下的缓冲器导通,其中考虑了在预击穿区域和近击穿区域中缓冲陷阱的影响以及这些陷阱在源漏电压变化的情况下的响应。电流-电压特性的温度依赖性已得到解决,并与陷阱占有率有关,电压和温度成函数关系。估计捕集阱浓度的定量方法可观察到预期的器件特性,而不会因缓冲液而引入任何伪影。

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