首页>
外国专利>
Semiconductor Device and Method of Forming Stacked Vias Within Interconnect Structure for FO-WLCSP
Semiconductor Device and Method of Forming Stacked Vias Within Interconnect Structure for FO-WLCSP
展开▼
机译:半导体器件和在互连结构内形成用于FO-WLCSP的堆叠通孔的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A semiconductor device has a semiconductor die mounted to a carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier is removed. A first insulating layer is formed over the encapsulant and semiconductor die. First vias are formed through the first insulating layer to expose contact pads of the semiconductor die. A first conductive layer is formed over the first insulating layer and into the first vias to electrically connect to the contact pads of the semiconductor die. A second insulating layer is formed over the first insulating layer and first conductive layer. Second vias are formed through the second insulating layer by laser direct ablation and aligned or offset with the first vias to expose the first conductive layer. A second conductive layer is formed over the second insulating layer and into the second vias. Conductive vias can be formed through the encapsulant.
展开▼