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The energy and particle fluxes during the growth of multifunctional ZrN thin films deposited by reactive magnetron sputtering

机译：反应磁控溅射沉积多功能ZrN薄膜生长过程中的能量和粒子通量

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Leroy Wouter; Depla Diederik;
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年度 2011
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正文语种 eng
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1. Growth of SiO_2 and TiO_2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes [J] . R. Alvarez, P. Romero-Gomez, J. Gil-Rostra, Physica status solidi . 2013,第4期

机译：反应磁控溅射和PECVD沉积SiO_2和TiO_2薄膜的非定向沉积通量的结合
2. Tribology of ZRN, CRN and TIALN thin films deposited by reactive magnetron sputtering [J] . Alexander Ruden, Federico Sequeda, Johans S Restrepo, Dyna . 2013,第178期

机译：反应磁控溅射沉积ZRN，CRN和TIALN薄膜的摩擦学
3. TRIBOLOGY OF ZRN, CRN AND TIALN THIN FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING [J] . ALEXANDER RUDEN, JUAN MANUEL GONZALEZ CARMONA, JOHANS S. RESTREPO, Dyna . 2013,第178期

机译：反应磁控溅射沉积ZRN，CRN和Tialn薄膜的摩擦学
4. Characterization of ZrN Thin Films Deposited by Reactive DC Magnetron Sputtering [C] . Attapol Choeysuppaket, Nirun Witit-anun, Surasing Chaiyakun International Conference on Applied Physics and Material Applications . 2013

机译：反应性DC磁控溅射沉积的ZrN薄膜的表征
5. Aluminium nitride piezoelectric thin films reactively deposited in closed field unbalanced magnetron sputtering for elevated temperature 'smart' tribological applications. [D] . Hasheminiasari, Masood. 2013

机译：在高温“智能”摩擦应用中，在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
6. Pathways to Tailor Photocatalytic Performance of TiO2 Thin Films Deposited by Reactive Magnetron Sputtering [O] . Alexander Vahl, Salih Veziroglu, Bodo Henkel, 2019

机译：反应磁控溅射沉积TiO2薄膜的光催化性能的途径
7. Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes [O] . Álvarez Rafael, Romero-Gómez Pablo, Gil-Rostra J., 2014

机译：通过反应磁控溅射和PECVD沉积SiO2和TiO2薄膜，并引入非定向沉积通量

The energy and particle fluxes during the growth of multifunctional ZrN thin films deposited by reactive magnetron sputtering

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