X-Ray Exposure of Electron-Deposited Photoresist for Conformal Lithography on Corrugated Surfaces

摘要

Proximity printing using synchrotron X-ray lithography provides high resolution pattern transfer with large depth of field, low diffraction effects and no reflection from the substrate. Electro-plating of photo-resist allows deposition of thin, uniform films over geometrically complex and topographically diverse, electrically conductive surfaces.