IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM

摘要

To summarize, this paper explores new application of laser lithography based on direct laser writing and focused ion beam technique, to pattern optically smooth surface of IP-Dip polymer for photonic devices and on-chip photonic applications. The surface image in nanometer scale was obtained by atomic force microscope. The surface analysis was made in XEI commercial software by use of areal roughness parameterSq. We have found that with this technique we can obtain much better results than the Raileigh criterion for smoothness. Finally, we found optimal process parameters of laser lithography for optically smooth surfaces and demonstrated the effect of ion beam treatment on surface quality.