SALT ACTING AS A PHOTOACID GENERATOR AND A PHOTORESIST COMPOSITION CONTAINING THE SAME SUITABLE FOR ARF EXCIMER LASER LITHOGRAPHY, KRF EXCIMER LASER LITHOGRAPHY, AND ARF IMMERSION LITHOGRAPHY

摘要

PURPOSE: A photoresist composition is provided to ensure excellent sensitivity and thermal resistance, and good resolution and adhesion to a substrate and to obtain a photoresist pattern with excellent CDU(CD uniformity) and excellent focus margin.;CONSTITUTION: A salt is represented by the formula (I-CC), wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC); and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.;COPYRIGHT KIPO 2011