SALT WHICH IS SUITABLE AS AN ACID GENERATOR, A PHOTORESIST COMPOSITION SUITABLE FOR AN ARF EXCIMER LASER LITHOGRAPHY, KRF EXCIMER LASER LITHOGRAPHY, EUV, EMULSION LITHOGRAPHY, AND ELECTRON BEAM LITHOGRAPHY, AND A MANUFACTURING METHOD OF PHOTORESIST PATTERNS

摘要

PURPOSE: A salt is provided to be suitable as an acid generator and to provide a photoresist composition capable of forming photoresist patterns having a low line edge roughness.;CONSTITUTION: A salt is represented by chemical formula 1. In chemical formula 1, Q^1 and Q^2 is respectively fluorine or C1-C6 perfluoroalkyl group, n is 0 or 1, L^1 is a single bond or C1-10 alkanediyl group, where the methylene group can be replaced by an oxygen or carbonyl group, but n is 0 then L^1 is not a single bond, ring W is a C3-36 aliphatic ring, where the methylene group can be replaced by oxygen, sulfur, a carbonyl group or a sulfonyl group. The hydrogen can be replaced by a hydroxy group, a C1-12 alkyl group, or a C1-12 alkoxy group. R^1 is a hydroxyl group, or a hydroxy group protected with a protective group, and Z^+ is an organic cation.;COPYRIGHT KIPO 2013