High Resolution Rapidly Programmable Masking for Functional Electronic Blocks

摘要

High-quality photographic masks are sought for use in delineating areas for the diffusions and interconnection patterns in the fabrication of functional electronic blocks for electronic circuits. Masking requirements which are considered to be consistent with the state-of-the-art are enumerated. Maskmaker specifications consistent with these requirements are listed. Several systems for making masks by the Microscribe approach are specified and are described. System approach, electrical, optical and mechanical design, and testing of the experimental model are described in detail. Methods of programming and error checking are also described. Optical problems associated with micro-imagery, as applicable to the present machine, have been investigated. A microscope objective was specified on the basis of these investigations. Optical tests have verified this selection and have also verified the required exposure time. Preliminary investigations indicate that the multiple image technique is feasible. Performance of the present machine has been checked by running a series of tests tapes through the machine and analyzing the results obtained on photographic plates.