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Optical study of direct interface in InP/InAlAs/InP double heterostructures grown by MOCVD

机译:MOCVD生长的InP / InAlAs / InP双异质结构中直接界面的光学研究

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A photoluminescence (PL) study of direct interface (InAlAs/InP) properties in InP/InAlAs heterostructures grown by metal-organic chemical vapor deposition on (10 0) InP substrate has been carried out. At low temperature, a broad PL band (FWHM = 120 meV) has been observed around 1 eV which is attributed to direct interface recombination. This PL line was strongly blue shifted (100 meV over three decades) when increasing the excitation density, and no saturation of the associated PL intensity was observed. This is the characteristic of type II or mixed type I-II transition. (C) 2002 Published by Elsevier Science B.V. [References: 14]
机译:已经进行了通过(10 0)InP衬底上的金属有机化学气相沉积生长的InP / InAlAs异质结构中的直接界面(InAlAs / InP)特性的光致发光(PL)研究。在低温下,已观察到大约1 eV的宽PL带(FWHM = 120 meV),这归因于直接界面重组。当增加激发密度时,该PL线发生了强烈的蓝移(在三十年内为100 meV),并且未观察到相关PL强度的饱和。这是II型或I-II型混合过渡的特征。 (C)2002由Elsevier Science B.V.出版[参考文献:14]

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