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首页> 外文期刊>Semiconductors >Changes in the Density of Nonradiative Recombination Centers in GaAs/AlGaAs Quantum-Well Structures as a Result of Treatment in CF_4 Plasma
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Changes in the Density of Nonradiative Recombination Centers in GaAs/AlGaAs Quantum-Well Structures as a Result of Treatment in CF_4 Plasma

机译:CF_4等离子体处理后的结果,GaAs / AlGaAs量子阱结构中非辐射复合中心的密度变化

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摘要

The effect of low-energy CF_4 plasma treatment on the stationary photoluminescence (PL) spectra and PL kinetics in GaAs/AlGaAs quantum-well (QW) structures is investigated. Intensity of the PL from QWs located deeper than the surface layer damaged by plasma treatment increases. It is established that this is accompanied by an increase in the PL decay time at temperatures above 30 K. It is shown that the density of nonradiative recombination centers in the QW located below the damaged surface layer decreases by a factor of 30 after 40-s exposure to plasma.
机译:研究了低能CF_4等离子体处理对GaAs / AlGaAs量子阱(QW)结构中的固定光致发光(PL)光谱和PL动力学的影响。来自比等离子处理损坏的表面层更深的QW的PL强度增加。已经确定,这伴随着温度高于30 K时PL衰减时间的增加。表明,位于受损表面层下方的QW中非辐射复合中心的密度在40秒后降低了30倍。暴露于血浆中。

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