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Co-fired AlN-TiN assembly as a new substrate technology for high-temperature power electronics packaging

机译:共烧AlN-TiN组件作为高温电力电子封装的新基板技术

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New wide-band gap semiconductors (SC) for power electronics such as SiC, GaN and diamond will allow higher power densities, leading to higher operating temperatures. However, the surrounding materials will also undergo an increase in temperature, meaning that a parallel effort is needed in SC packaging technologies research. One of the essential components, the substrate, is used to insulate electrically the SC from the rest of the system, drain the generated heat and provide a path to connect the SC to the rest of the system. Direct bonded copper (DBC) and active metal-brazed (AMB) substrates have limited temperature and cycling operation, owing to the large differences in the thermal expansion coefficients between the ceramics and the metals. In this work we propose a new and original substrate technology based on two co-sintered ceramics: an insulating ceramic (AlN) and a conductive one (TIN). The microstructure, the chemical compatibility and the electrical properties indicate that the proposed substrate could operate at a temperature above 200 °C the current substrate technologies, which makes it particularly attractive for high-temperature power electronics applications.
机译:用于功率电子器件(例如SiC,GaN和金刚石)的新型宽带隙半导体(SC)将允许更高的功率密度,从而导致更高的工作温度。但是,周围材料的温度也会升高,这意味着在SC封装技术研究中需要并行努力。基本组件之一,即基板,用于使SC与系统的其余部分电气绝缘,排出产生的热量并提供将SC与系统的其余部分连接的路径。由于陶瓷和金属之间的热膨胀系数差异很大,直接键合铜(DBC)和活性金属钎焊(AMB)基板的温度和循环操作受到限制。在这项工作中,我们提出了一种基于两种共烧结陶瓷的新的原始衬底技术:绝缘陶瓷(AlN)和导电陶瓷(TIN)。微观结构,化学相容性和电性能表明,提出的基板可以在当前基板技术的200°C以上的温度下运行,这使其特别适合于高温电力电子应用。

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