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首页> 外文期刊>Ferroelectrics: Letters Section >THE INVESTIGATION OF Pb-SUFFICIENT BUFFER LAYER ON THE FERROELECTRIC PROPERTIES IN Pt/PZT/Pt structure
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THE INVESTIGATION OF Pb-SUFFICIENT BUFFER LAYER ON THE FERROELECTRIC PROPERTIES IN Pt/PZT/Pt structure

机译:Pt / PZT / Pt结构中足够的Pb缓冲层对铁电性能的研究

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摘要

In this study, we prepared lead zirconate titanate (PZT) thin film with buffer layer by sol-gel method to investigate the role of interface composition on t he ferroelectric behavior of PZT thin film. About 50-nm-thick PZT buffer layer containing various amount of excess Pb was served as an interfacial layer. After drying the buffer layer, about 200 nm thick PZT film containing 15 percent excess Pb was over-deposited. According to the increase of excess Pb content for the interfacial PZT layer, an integral PZT film showed an improvement of crystalline quality and negligible polarization fatigue behavior even after repeated 10~9 cycles in Pt/PZT/Pt structure. Therefore, we could believe that compositional and crystalline state of PZT buffer layer contacting Pt substrate has an important role on the entire film properties.
机译:在这项研究中,我们通过溶胶-凝胶法制备了带缓冲层的钛酸锆钛酸铅(PZT)薄膜,以研究界面组成对PZT薄膜铁电性能的影响。包含各种过量Pb的约50nm厚的PZT缓冲层用作界面层。干燥缓冲层后,过量沉积约200 nm厚的PZT膜,其中含15%的过量Pb。随着界面PZT层中过量Pb含量的增加,完整的PZT膜即使在Pt / PZT / Pt结构中重复10〜9个循环后仍显示出结晶质量的改善和可忽略的极化疲劳行为。因此,我们可以相信接触Pt衬底的PZT缓冲层的组成和结晶状态对整个膜的性能具有重要作用。

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