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THICKNESS EFFECT OF BaPbO3 BUFFER LAYERS ON THE FERROELECTRIC PROPERTIES OF PZT THIN FILMS

机译:BAPBO3缓冲层对PZT薄膜铁电特性的厚度效应

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The microstructure and electrical properties of lead zirconate titanate (PZT) thin films deposited at 475°C by RF-magnetron sputtering were studied as a function of BaPbC>3 (BPO) thickness, 23nm, 65nm, and 136 nm-thick BPO were adopted in this study. The dielectric constant is approximately 433 for Pt/PZT/BPO(23 nm), 443 for Pt/PZT/BPO(65 nm), and 466 for Pt/PZT/BPO(136 nm), The remanant polarization values in these three type capacitors are 152, 16.0, and 12.4uC/cm2, and the coercive field values are 83,5, 75.1, and 59.2 kV/cm, respectively The reduction of polarization within 30000 s is about 18%, 24%, and 28% for PZT capacitors with 23, 65, and 136 nm-thick BPO, respectively Considering the tradeoffs between crystalline quality and the amount of a-domain, the optimum thickness of BPO buffer layer in this work is 65 nm.
机译:通过RF-磁控溅射在475℃下沉积在475℃下沉积的锆钛酸铅(PZT)薄膜的微观结构和电性能作为BAPBC> 3(BPO)厚度,23nm,65nm和136nm厚的BPO。在这个研究中。对于Pt / PZT / BPO(65nm)的Pt / PZT / BPO(23nm),443,466,对于Pt / PZT / BPO(136nm),介电常数为433,466,这三种类型中的缩回偏振值电容器为152,16.0和12.4uc / cm2,矫顽场值为83,5,75.1和59.2 kV / cm,分别在30000秒内的极化的降低约为18%,24%和28% PZT电容器,具有23,65和136nm-厚的BPO,分别考虑结晶质量和α-域的量之间的折衷,该工作中BPO缓冲层的最佳厚度为65nm。

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