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Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency

机译:在157 nm半导体光刻中用作防护薄膜的新型氢氟烃聚合物:透明性的基础

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With the advent of 157 nm as the next photolithographic wavelength, there has been a need to find transparent and radiation durable polymers for use as soft pellicles. Pellicles are approx 1 mum thick polymer membranes used in the photolithographic repordouction of semiconductor integrated circuits to prevent dust particles on the surface of the photomask from imaging into the photoresist coated after. Practical pellicle films must transmit at least 98% of incident light and have sufficient radiation durability to withstand kilojoules of optical irradiation at the lithographic wavelength. As exposure wavelengths have become shorter the electronics industry have been able to achieve adequate transparency only by moving from nitrocellulose polymers to perfluorinated polymers as, for example, Teflon~R AF1600 and Cytop~(TM) for use in 193 nm photolithography. Unfortunately, the transparency advantages of perfluorinated polymers fail spectacularly at 157 nm; 1 mum thick films of Teflon~R AF 1600 and Cytop~(TM) have 157 nm transparency of no more than 38 and 2%, respectively, with 157 nm pellicle lifetimes measured in millijoules. Polymers such as -[(CH_2CHF)_xC(CF_3)_2CH_2]_y-, or -(CH_2CF_2)_x[2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxole]_y-with chains that alternate fluorocarbon segments with either oxygen or hydrocarbon segments frequently show >98% transparency at 157 nm, if amorphous. These polymers are made from monomers, such as vinylidene fluoride (VF_2) and hexafluoroisobutylene, which themselves exhibit good alternation of CH_2 and CF_2 in their structures. IN addition, we find that ether linkages also can serve to force alternation. In addition, we find that fluorocarbon segments shorter than six carbons, and hydrocarbon segments less than two carbons or less than three carbons if partially fluorinated also promote 157 nm transparency. We also find that even with these design principles, it is advantageous to avoid small rings, as arise in the cyclobutanes. These results suggest a steric component to transparency in addition to the importance of alternation. Upon irradiation these polymer undergo photochemical darkening and therefore none has demonsted the kilojoule radiation durability lifetimes required to be commerically attractive. This is likely because these exposure lifetimes require very bond to absorb approx10 photons, each photon having an energy roughly twice common bond energies. We have studied intrinsic (composition, molecular weight) and extrinsic (trace metals, impurities, environmental contaminants, oxygen, water) contributions to optical absorption and photochemical darkening in these polymers. Studies of photochemical darkening in model molecules illustrate the dynamics of photochemical darkening and that appreciable lifetimes can be achieved in fluorocarbons. To a first approximation the polymers that have lower 157 nm optical absorbance also tend to show the longest lifetimes. These results imply that quantum yield, or the extent to which the polymer structure can harmlessly dissipate the energy, can be important as well.
机译:随着下一个光刻波长为157 nm的出现,需要找到透明且耐辐射的聚合物用作软薄膜。膜片是大约1微米厚的聚合物膜,用于半导体集成电路的光刻技术中,以防止光掩模表面上的灰尘颗粒成像到随后涂覆的光刻胶中。实用的防护膜必须至少透射98%的入射光,并具有足够的辐射耐久性,以承受在光刻波长下千焦耳的光辐射。随着曝光波长变得越来越短,电子工业仅通过从硝化纤维聚合物转移到全氟化聚合物,例如用于193 nm光刻的Teflon®AF1600和CytopTM,就能够获得足够的透明度。不幸的是,全氟化聚合物的透明性优势在157 nm处显着下降。 1毫米厚的Teflon®R AF 1600和Cytop®薄膜的157 nm透明度分别不超过38%和2%,以毫焦耳计的157 nm薄膜寿命。具有-[(CH_2CHF)_xC(CF_3)_2CH_2] _y-或-(CH_2CF_2)_x [2,2-双(三氟甲基)-4,5-二氟-1,3-二恶唑] _y-的聚合物如果是无定形的,具有氧或烃链段的碳氟化合物链段通常在157 nm处显示> 98%的透明度。这些聚合物由单体制成,例如偏二氟乙烯(VF_2)和六氟异丁烯,它们本身在结构上表现出CH_2和CF_2的良好交替。另外,我们发现以太键也可以用于强迫交替。此外,我们发现,如果部分氟化,则氟碳链段短于六个碳,而碳氢链段短于两个碳或少于三个碳,也会提高157 nm的透明度。我们还发现,即使采用这些设计原理,避免环丁烷中出现的小环也是有利的。这些结果表明,除了交替的重要性之外,透明度还具有空间上的意义。辐照后,这些聚合物会发生光化学变暗,因此没有一个降低了商业吸引力所需的千焦辐射耐久性。这可能是因为这些曝光寿命需要非常强的键才能吸收大约10个光子,每个光子的能量大约是普通键能的两倍。我们已经研究了内在的(组成,分子量)和外在的(痕量金属,杂质,环境污染物,氧气,水)对这些聚合物的光吸收和光化学变黑的贡献。对模型分子中光化学变黑的研究表明了光化学变黑的动力学,并且在碳氟化合物中可以实现相当长的寿命。近似地,具有较低的157nm光吸收的聚合物也倾向于显示最长的寿命。这些结果表明,量子产率或聚合物结构可以无害地耗散能量的程度也很重要。

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