Polymers Based on a Novel 1,3-perfluorodioxole for Use as a Soft Polymer Pellicle in 157nm Lithography

摘要

A series of copolymers of tetrafluoroethylene and 4-trifluormethoxy-l,3-perfluorodioxole (TFETFMD) were prepared as well as a homopolymer of the dioxole (TEMD) using various free-radical initiators.The copolymers were characterized by ~(19)F NMR,TGA,DSC and VUV measurements.The transparency at 157nm increased with increasing dioxole content reaching an a (mum~(-1)) = 0.76 for an unoptimized homopolymer of the dioxole prepared with a perfluorinated peroxide initiator.Exposure studies of the dioxole homopolymer at 157 nm indicate rapid formation of carbonyl species and therefore an anticipated short lifetime as a potential polymer pellicle for 157 nm lithography.