Transparency improvement of the resist - copolymer for 157 nm - photolithography, by the use of fluorinated cinnamic acid derivatives

摘要

Chemically amplified photoresist, comprising:a polymer, the acid labile groups which, under the action of a acid and polar groups are split off, release an increase in the solubility of the polymer in aqueous alkaline developers, wherein the polymer first recurring units which are derived from cinnamic acid or cinnamic esters, which at least one fluorinated alkyl or fluorine are substituted;a photo acid generator;a solvent.